http://www.semiconductor.net Mon, 09 Nov 2009 06:56:15 MST eng Copyright 2009 Reed Business Information. Subject to its Terms of Use (http://www.semiconductor.net/info/terms-and-conditions.php) http://www.semiconductor.net/article/354403-Massive_Mask_Data_Calls_for_New_Methods.php?rssid=20226 http://www.semiconductor.net/article/354403-Massive_Mask_Data_Calls_for_New_Methods.php?rssid=20226 Thu, 17 Sep 2009 14:06:35 GMT Dealing with the ballooning volumes of mask data was on the agenda at the SPIE Photomask... http://www.semiconductor.net/article/354185-Zeiss_Delivers_EUV_Optics_to_ASML.php?rssid=20226 http://www.semiconductor.net/article/354185-Zeiss_Delivers_EUV_Optics_to_ASML.php?rssid=20226 Wed, 16 Sep 2009 16:11:02 GMT Carl Zeiss has delivered a complete EUV optical subsystem for the production-ready EUV scanners... http://www.semiconductor.net/article/354158-Polcari_Touts_EUV_at_SPIE_Photomask.php?rssid=20226 http://www.semiconductor.net/article/354158-Polcari_Touts_EUV_at_SPIE_Photomask.php?rssid=20226 Wed, 16 Sep 2009 14:27:13 GMT Michael Polcari, president and CEO of Sematech, detailed the major challenges facing EUV... http://www.semiconductor.net/article/353856-KLA_Tencor_Introduces_Teron_600_Mask_Inspection_System.php?rssid=20226 http://www.semiconductor.net/article/353856-KLA_Tencor_Introduces_Teron_600_Mask_Inspection_System.php?rssid=20226 Tue, 15 Sep 2009 13:05:09 GMT Coinciding with the SPIE Photomask conference, KLA-Tencor introduced a mask defect inspection... http://www.semiconductor.net/article/339296-Molecular_Imprints_Takes_Template_Replication_to_HDD_Production.php?rssid=20226 http://www.semiconductor.net/article/339296-Molecular_Imprints_Takes_Template_Replication_to_HDD_Production.php?rssid=20226 Wed, 02 Sep 2009 19:46:29 GMT Molecular Imprints Inc. today introduced the Perfecta TR1100 template replication system to the... http://www.semiconductor.net/article/339112-Polcari_to_Call_for_EUV_Infrastructure.php?rssid=20226 http://www.semiconductor.net/article/339112-Polcari_to_Call_for_EUV_Infrastructure.php?rssid=20226 Tue, 01 Sep 2009 15:47:44 GMT At the SPIE/BACUS Photomask Symposium, Sematech CEO Mike Polcari will give a keynote speech on... http://www.semiconductor.net/article/316386-Optical_Lithography_Is_Still_the_Technology_to_Beat.php?rssid=20226 http://www.semiconductor.net/article/316386-Optical_Lithography_Is_Still_the_Technology_to_Beat.php?rssid=20226 Fri, 24 Jul 2009 21:20:35 GMT Although EUV lithography is widely considered the prime candidate for post-optical lithography,... http://www.semiconductor.net/article/315938-EUV_Sources_Come_Back_as_Top_EUV_Lithography_Concern.php?rssid=20226 http://www.semiconductor.net/article/315938-EUV_Sources_Come_Back_as_Top_EUV_Lithography_Concern.php?rssid=20226 Tue, 21 Jul 2009 16:15:54 GMT This time it's the sources used for extreme ultraviolet (EUV) metrology that are a concern, as... http://www.semiconductor.net/article/315511-Toolmakers_Ease_Double_Patterning_Throughput_Hit.php?rssid=20226 http://www.semiconductor.net/article/315511-Toolmakers_Ease_Double_Patterning_Throughput_Hit.php?rssid=20226 Thu, 16 Jul 2009 15:38:06 GMT At this year's Sokudo Lithography Breakfast Forum at SEMICON West, toolmakers presented their... http://www.semiconductor.net/article/314889-Next_Gen_Nanoimprint_Stepper_Improves_Defectivity_Alignment.php?rssid=20226 http://www.semiconductor.net/article/314889-Next_Gen_Nanoimprint_Stepper_Improves_Defectivity_Alignment.php?rssid=20226 Mon, 13 Jul 2009 13:00:00 GMT EV Group announced its latest UV-NIL stepper in conjunction with SEMICON West, but the tool is... http://www.semiconductor.net/article/307152-Sematech_Seeks_EUV_Mask_Tool_Funding.php?rssid=20226 http://www.semiconductor.net/article/307152-Sematech_Seeks_EUV_Mask_Tool_Funding.php?rssid=20226 Tue, 30 Jun 2009 15:20:52 GMT Few commercial suppliers are stepping up to develop the EUV mask inspection tools that will be... http://www.semiconductor.net/article/295761-Advanced_Imaging_Solutions_for_Shrinking_the_k1_Gap.php?rssid=20226 http://www.semiconductor.net/article/295761-Advanced_Imaging_Solutions_for_Shrinking_the_k1_Gap.php?rssid=20226 Thu, 25 Jun 2009 19:15:17 GMT There's still room for improvement in optical lithography. At SEMICON West, Stephen Renwick of... http://www.semiconductor.net/article/295755-SEMICON_West_Session_Focuses_on_22_nm_Lithography.php?rssid=20226 http://www.semiconductor.net/article/295755-SEMICON_West_Session_Focuses_on_22_nm_Lithography.php?rssid=20226 Thu, 25 Jun 2009 18:39:11 GMT Moderated by Semiconductor International Executive Editor Aaron Hand, the "Lithography... http://www.semiconductor.net/article/295595-Printable_Electronics_Hits_Display_Needs.php?rssid=20226 http://www.semiconductor.net/article/295595-Printable_Electronics_Hits_Display_Needs.php?rssid=20226 Wed, 24 Jun 2009 14:07:54 GMT Printable electronics could reduce the cost of making flexible displays of the kind used in the... http://www.semiconductor.net/article/295501-Applied_DNS_Reshuffle_Stakes_in_Sokudo.php?rssid=20226 http://www.semiconductor.net/article/295501-Applied_DNS_Reshuffle_Stakes_in_Sokudo.php?rssid=20226 Tue, 23 Jun 2009 13:51:05 GMT Applied Materials and Dainippon Screen said they are adjusting ownership in the Sokudo track... http://www.semiconductor.net/article/278860-EUV_Reduced_to_an_Engineering_Problem.php?rssid=20226 http://www.semiconductor.net/article/278860-EUV_Reduced_to_an_Engineering_Problem.php?rssid=20226 Tue, 09 Jun 2009 16:15:36 GMT EUV seems to be finally at the stage of "just an engineering problem," though a sufficiently... http://www.semiconductor.net/article/278844-Rave_Lands_Rhazer_at_Chartered_s_Fab_7.php?rssid=20226 http://www.semiconductor.net/article/278844-Rave_Lands_Rhazer_at_Chartered_s_Fab_7.php?rssid=20226 Tue, 09 Jun 2009 15:05:14 GMT Rave LLC said its Rhazer haze removal technology has been evaluated by Chartered Semiconductor.... http://www.semiconductor.net/article/277015-Nikon_to_Reduce_Lithography_Workforce_by_1000.php?rssid=20226 http://www.semiconductor.net/article/277015-Nikon_to_Reduce_Lithography_Workforce_by_1000.php?rssid=20226 Wed, 27 May 2009 11:24:00 GMT Facing “further severe business conditions,” Nikon Corp. said it will reorganize its... http://www.semiconductor.net/article/232542-Novellus_Adapts_Resist_Strip_for_3X_Node.php?rssid=20226 http://www.semiconductor.net/article/232542-Novellus_Adapts_Resist_Strip_for_3X_Node.php?rssid=20226 Thu, 14 May 2009 15:39:00 GMT Novellus Systems said it has developed a photoresist stripping process that meets the challenges... http://www.semiconductor.net/article/209743-IMEC_Makes_Functional_22_nm_SRAM_Cells_With_EUV_Lithography.php?rssid=20226 http://www.semiconductor.net/article/209743-IMEC_Makes_Functional_22_nm_SRAM_Cells_With_EUV_Lithography.php?rssid=20226 Wed, 22 Apr 2009 16:44:00 GMT IMEC has achieved its next milestone with EUV lithography, creating the first functional 22 nm... http://www.semiconductor.net/article/209624-Dual_Track_Sokudo_Duo_Boosts_Throughput.php?rssid=20226 http://www.semiconductor.net/article/209624-Dual_Track_Sokudo_Duo_Boosts_Throughput.php?rssid=20226 Tue, 21 Apr 2009 13:16:00 GMT Sokudo announced a dual-track system, the Sokudo Duo, aimed at boosting throughput of the coat,... http://www.semiconductor.net/article/209833-Imprint_Rides_Photonic_Crystal_Wave.php?rssid=20226 http://www.semiconductor.net/article/209833-Imprint_Rides_Photonic_Crystal_Wave.php?rssid=20226 Mon, 20 Apr 2009 14:27:00 GMT Light-emitting diodes (LEDs) may gain efficiencies by using photonic crystals defined by imprint... http://www.semiconductor.net/article/197886-ASML_Expects_Demand_Collapse_to_Turn_Around_in_Second_Half.php?rssid=20226 http://www.semiconductor.net/article/197886-ASML_Expects_Demand_Collapse_to_Turn_Around_in_Second_Half.php?rssid=20226 Wed, 15 Apr 2009 16:37:00 GMT The first quarter saw the lithography tool manufacturer’s sales plummet 80% year over year,... http://www.semiconductor.net/article/208453-Shin_Etsu_MicroSi_Celebrates_20_Years_20_CAGR.php?rssid=20226 http://www.semiconductor.net/article/208453-Shin_Etsu_MicroSi_Celebrates_20_Years_20_CAGR.php?rssid=20226 Tue, 24 Mar 2009 18:59:00 GMT Having established itself as a provider of silicon, the next step for Shin-Etsu MicroSi is in... http://www.semiconductor.net/article/208359-Imprint_Goes_Flexible_as_It_Goes_Big.php?rssid=20226 http://www.semiconductor.net/article/208359-Imprint_Goes_Flexible_as_It_Goes_Big.php?rssid=20226 Tue, 24 Mar 2009 13:28:00 GMT With a tenfold increase in turnout, the more than 200 lithographers who attended the imprint... http://www.semiconductor.net/article/208865-Plenty_of_Reasons_to_Be_Confident_About_EUV_Lithography.php?rssid=20226 http://www.semiconductor.net/article/208865-Plenty_of_Reasons_to_Be_Confident_About_EUV_Lithography.php?rssid=20226 Wed, 11 Mar 2009 13:25:00 GMT Although accounts from some other corners of the recent SPIE Advanced Lithography conference... http://www.semiconductor.net/article/201395-Alliance_Pushes_Forward_With_EUV_Test_at_22_15_nm.php?rssid=20226 http://www.semiconductor.net/article/201395-Alliance_Pushes_Forward_With_EUV_Test_at_22_15_nm.php?rssid=20226 Fri, 06 Mar 2009 16:51:00 GMT Noting how quickly the technology is moving, the IBM Alliance has wrapped up its work on a 45 nm... http://www.semiconductor.net/article/197223-Source_Mask_Optimization_Continues_on_Track.php?rssid=20226 http://www.semiconductor.net/article/197223-Source_Mask_Optimization_Continues_on_Track.php?rssid=20226 Fri, 27 Feb 2009 15:49:00 GMT IBM and Mentor Graphics provided an update on their effort to develop source-mask optimization... http://www.semiconductor.net/article/204945-KLA_Tencor_Opens_Up_About_E_Beam_Lithography_Work.php?rssid=20226 http://www.semiconductor.net/article/204945-KLA_Tencor_Opens_Up_About_E_Beam_Lithography_Work.php?rssid=20226 Fri, 27 Feb 2009 14:03:00 GMT Along with a host of others, the inspection giant is trying to solve the throughput roadblock... http://www.semiconductor.net/article/209144-New_Collaboration_Aims_to_Accelerate_Direct_Write_E_Beam_Adoption.php?rssid=20226 http://www.semiconductor.net/article/209144-New_Collaboration_Aims_to_Accelerate_Direct_Write_E_Beam_Adoption.php?rssid=20226 Wed, 25 Feb 2009 15:05:00 GMT Some 20 companies throughout the semiconductor supply chain have created the eBeam Initiative to... http://www.semiconductor.net/article/203172-Sematech_and_Asahi_Glass_Partner_on_EUV_Mask_Blanks.php?rssid=20226 http://www.semiconductor.net/article/203172-Sematech_and_Asahi_Glass_Partner_on_EUV_Mask_Blanks.php?rssid=20226 Wed, 25 Feb 2009 14:26:00 GMT Sematech and Asahi Glass Co. will work together in Albany, N.Y., on mask blanks for EUV... http://www.semiconductor.net/article/204766-Lithographers_Struggle_to_Find_Answers_Below_20_nm.php?rssid=20226 http://www.semiconductor.net/article/204766-Lithographers_Struggle_to_Find_Answers_Below_20_nm.php?rssid=20226 Mon, 23 Feb 2009 14:41:00 GMT Leading up to a week of SPIE Advanced Lithography in San Jose, a range of industry speakers... http://www.semiconductor.net/article/202233-Photronics_Takes_Bigger_Hit_in_Fiscal_Q1.php?rssid=20226 http://www.semiconductor.net/article/202233-Photronics_Takes_Bigger_Hit_in_Fiscal_Q1.php?rssid=20226 Wed, 18 Feb 2009 16:16:00 GMT Although the seasonality of the first fiscal quarter is always a difficult one, Photronics Inc.... http://www.semiconductor.net/article/205511-Nikon_Scales_Back_Lithography_Expansion_Plan.php?rssid=20226 http://www.semiconductor.net/article/205511-Nikon_Scales_Back_Lithography_Expansion_Plan.php?rssid=20226 Thu, 05 Feb 2009 15:05:00 GMT Nikon Corp. said it has scaled back plans to expand its capacity to make 193 nm immersion... http://www.semiconductor.net/article/206000-Obducat_Joins_Europe_s_Teramagstor_Project.php?rssid=20226 http://www.semiconductor.net/article/206000-Obducat_Joins_Europe_s_Teramagstor_Project.php?rssid=20226 Thu, 05 Feb 2009 14:20:00 GMT Nanoimprint lithography (NIL) vendor Obducat AB (Malmö, Sweden) said it will join the European... http://www.semiconductor.net/article/197490-JSR_Promotes_Koshiba_SUSS_MicroTec_Welcomes_Averdung.php?rssid=20226 http://www.semiconductor.net/article/197490-JSR_Promotes_Koshiba_SUSS_MicroTec_Welcomes_Averdung.php?rssid=20226 Tue, 03 Feb 2009 16:25:00 GMT JSR Corp. (Tokyo) promoted Mitsunobu Koshiba to president, effective April 1, and SUSS MicroTec... http://www.semiconductor.net/article/207990-Molecular_Imprints_Aims_at_Japan_Market.php?rssid=20226 http://www.semiconductor.net/article/207990-Molecular_Imprints_Aims_at_Japan_Market.php?rssid=20226 Thu, 29 Jan 2009 14:55:00 GMT Molecular Imprints Inc. CEO Mark Melliar-Smith said Japan presents large opportunities for... http://www.semiconductor.net/article/201644-ASML_Reasserts_Severe_Deterioration_in_Tool_Orders.php?rssid=20226 http://www.semiconductor.net/article/201644-ASML_Reasserts_Severe_Deterioration_in_Tool_Orders.php?rssid=20226 Thu, 15 Jan 2009 16:39:00 GMT In the lithography giant’s Q4 and 2008 revenue call today, executives reiterated last... http://www.semiconductor.net/article/206192-Samsung_Electronics_Orders_Zeiss_Mask_Metrology_System.php?rssid=20226 http://www.semiconductor.net/article/206192-Samsung_Electronics_Orders_Zeiss_Mask_Metrology_System.php?rssid=20226 Thu, 08 Jan 2009 15:50:00 GMT Samsung Electronics ordered a mask metrology tool from Carl Zeiss SMT, the second company to... http://www.semiconductor.net/article/199012-Photronics_Quarterly_and_Annual_Revenue_Up_Slightly.php?rssid=20226 http://www.semiconductor.net/article/199012-Photronics_Quarterly_and_Annual_Revenue_Up_Slightly.php?rssid=20226 Wed, 17 Dec 2008 17:50:00 GMT Maskmaker Photronics Inc. (Brookfield, Conn.) said today that its financial results for the... http://www.semiconductor.net/article/197404-IEDM_Panel_Processing_Costs_Headed_Up.php?rssid=20226 http://www.semiconductor.net/article/197404-IEDM_Panel_Processing_Costs_Headed_Up.php?rssid=20226 Wed, 17 Dec 2008 14:27:00 GMT With more expensive tools and new process modules coming, IC manufacturers will struggle to... http://www.semiconductor.net/article/202391-NuFlare_Orders_Zeiss_Mask_Metrology_Tool.php?rssid=20226 http://www.semiconductor.net/article/202391-NuFlare_Orders_Zeiss_Mask_Metrology_Tool.php?rssid=20226 Wed, 03 Dec 2008 15:54:00 GMT Carl Zeiss SMT disclosed one of the first orders for its next-generation mask metrology system... http://www.semiconductor.net/article/196702-Applied_Announces_TSV_Etcher_In_Fab_Mask_Inspection_Capability.php?rssid=20226 http://www.semiconductor.net/article/196702-Applied_Announces_TSV_Etcher_In_Fab_Mask_Inspection_Capability.php?rssid=20226 Mon, 01 Dec 2008 17:25:00 GMT Applied Materials Inc. announced its Silvia deep silicon etcher for creation of the smooth... http://www.semiconductor.net/article/204220-SUSS_MicroTec_Names_New_CEO.php?rssid=20226 http://www.semiconductor.net/article/204220-SUSS_MicroTec_Names_New_CEO.php?rssid=20226 Tue, 25 Nov 2008 18:49:00 GMT Frank Averdung, currently managing director at Carl Zeiss SMS, will move into the CEO position... http://www.semiconductor.net/article/202699-FSI_Receives_Repeat_Polaris_Order_From_GaAs_Foundry.php?rssid=20226 http://www.semiconductor.net/article/202699-FSI_Receives_Repeat_Polaris_Order_From_GaAs_Foundry.php?rssid=20226 Wed, 19 Nov 2008 21:39:00 GMT Orders within the broadband wireless and wireline communications device suppliers are expected... http://www.semiconductor.net/article/200655-Cymer_Hitting_Its_EUV_LPP_Source_Goals.php?rssid=20226 http://www.semiconductor.net/article/200655-Cymer_Hitting_Its_EUV_LPP_Source_Goals.php?rssid=20226 Wed, 12 Nov 2008 16:43:00 GMT Cymer said it is running its laser-produced plasma (LPP) EUV source for eight hours at a time at... http://www.semiconductor.net/article/199097-IMEC_Calls_EUV_Performance_Impressive_.php?rssid=20226 http://www.semiconductor.net/article/199097-IMEC_Calls_EUV_Performance_Impressive_.php?rssid=20226 Thu, 23 Oct 2008 10:14:00 GMT After only five months’ experience with a new source on its Alpha Demo Tool (ADT), Kurt Ronse,... http://www.semiconductor.net/article/203286-ASML_Presents_Faster_ArF_Scanner_Says_EUV_on_Track_for_2010.php?rssid=20226 http://www.semiconductor.net/article/203286-ASML_Presents_Faster_ArF_Scanner_Says_EUV_on_Track_for_2010.php?rssid=20226 Mon, 20 Oct 2008 13:44:00 GMT ASML said it is on schedule for 2010 delivery of its first EUV production system. At a research... http://www.semiconductor.net/article/199870-Kovio_Demonstrates_RFID_Tags_Using_Printed_Electronics.php?rssid=20226 http://www.semiconductor.net/article/199870-Kovio_Demonstrates_RFID_Tags_Using_Printed_Electronics.php?rssid=20226 Thu, 16 Oct 2008 15:27:00 GMT Kovio Inc. (Milpitas, Calif.) announced today at a conference in Chicago that it is... http://www.semiconductor.net/article/198718-Mapper_to_Ship_E_Beam_Lithography_System_to_TSMC.php?rssid=20226 http://www.semiconductor.net/article/198718-Mapper_to_Ship_E_Beam_Lithography_System_to_TSMC.php?rssid=20226 Mon, 13 Oct 2008 15:48:00 GMT Mapper Lithography (Delft, Netherlands) will ship its first 300 mm multi-column e-beam maskless... http://www.semiconductor.net/article/204601-Mapper_Lithography_Names_Hegarty_as_CEO.php?rssid=20226 http://www.semiconductor.net/article/204601-Mapper_Lithography_Names_Hegarty_as_CEO.php?rssid=20226 Fri, 10 Oct 2008 16:57:00 GMT Maskless lithography startup Mapper Lithography (Delft, Netherlands) named Christopher Hegarty... http://www.semiconductor.net/article/204880-Photomask_Printability_Standards_and_Cleaning_Remain_Concerns.php?rssid=20226 http://www.semiconductor.net/article/204880-Photomask_Printability_Standards_and_Cleaning_Remain_Concerns.php?rssid=20226 Fri, 10 Oct 2008 15:14:00 GMT At the 28th Photomask Technology conference in Monterey, Calif., technologists discussed ways to... http://www.semiconductor.net/article/198979-De_Geus_Highlights_Photomask_Simulation_Challenge.php?rssid=20226 http://www.semiconductor.net/article/198979-De_Geus_Highlights_Photomask_Simulation_Challenge.php?rssid=20226 Wed, 08 Oct 2008 15:28:00 GMT Synopsys CEO Aart de Geus described the need for more powerful simulation engines and other... http://www.semiconductor.net/article/201377-Looking_for_Lake_Tahoe_A_Metaphor_for_EUVL_Development.php?rssid=20226 http://www.semiconductor.net/article/201377-Looking_for_Lake_Tahoe_A_Metaphor_for_EUVL_Development.php?rssid=20226 Wed, 01 Oct 2008 16:56:00 GMT International EUVL Symposium: Vivek Bakshi offers his perspective on the progress reported this... http://www.semiconductor.net/article/205984-Carl_Zeiss_Invests_in_3_D_Nanostructuring_Startup_Nanoscribe.php?rssid=20226 http://www.semiconductor.net/article/205984-Carl_Zeiss_Invests_in_3_D_Nanostructuring_Startup_Nanoscribe.php?rssid=20226 Wed, 01 Oct 2008 15:32:00 GMT Carl Zeiss has acquired a stake in Nanoscribe (Karlsruhe, Germany), a startup that recently... http://www.semiconductor.net/article/199420-Mass_Storage_Pins_Progress_Hopes_on_Aggressive_Litho.php?rssid=20226 http://www.semiconductor.net/article/199420-Mass_Storage_Pins_Progress_Hopes_on_Aggressive_Litho.php?rssid=20226 Fri, 26 Sep 2008 18:45:00 GMT Storage requirements in HDDs and SSDs are increasing at a rate that will require fast progress... http://www.semiconductor.net/article/197438-SoftJin_Rolls_Out_Mask_Defect_Analysis_Tool.php?rssid=20226 http://www.semiconductor.net/article/197438-SoftJin_Rolls_Out_Mask_Defect_Analysis_Tool.php?rssid=20226 Thu, 25 Sep 2008 15:06:00 GMT SoftJin Technologies said it has developed a mask defect analysis tool that initially supports... http://www.semiconductor.net/article/203964-IBM_Mentor_Toppan_to_Develop_Source_Mask_Optimization_for_22_nm_Node.php?rssid=20226 http://www.semiconductor.net/article/203964-IBM_Mentor_Toppan_to_Develop_Source_Mask_Optimization_for_22_nm_Node.php?rssid=20226 Thu, 18 Sep 2008 11:37:00 GMT IBM, Mentor Graphics and Toppan Printing will develop a suite of technologies that IBM calls... http://www.semiconductor.net/article/202437-Sematech_Names_Leaders_of_Lithography_Division.php?rssid=20226 http://www.semiconductor.net/article/202437-Sematech_Names_Leaders_of_Lithography_Division.php?rssid=20226 Tue, 09 Sep 2008 15:37:00 GMT After some four months in limbo, Sematech today announced that it has named the new director and... http://www.semiconductor.net/article/201141-German_Ministry_Funds_Mask_Project.php?rssid=20226 http://www.semiconductor.net/article/201141-German_Ministry_Funds_Mask_Project.php?rssid=20226 Thu, 04 Sep 2008 15:31:00 GMT The German government will fund a mask development project aimed at 32/22 nm masks, with... http://www.semiconductor.net/article/207333-Obducat_Garners_Nanoimprint_Orders_From_LED_Maker_Luxtaltek.php?rssid=20226 http://www.semiconductor.net/article/207333-Obducat_Garners_Nanoimprint_Orders_From_LED_Maker_Luxtaltek.php?rssid=20226 Thu, 21 Aug 2008 13:22:00 GMT Sweden's Obducat AB said it has received an order for two of its NIL systems from Luxtaltek... http://www.semiconductor.net/article/201564-Researchers_Apply_Self_Assembly_to_NIL_Master_for_Bit_Patterned_Media.php?rssid=20226 http://www.semiconductor.net/article/201564-Researchers_Apply_Self_Assembly_to_NIL_Master_for_Bit_Patterned_Media.php?rssid=20226 Tue, 19 Aug 2008 16:13:00 GMT Researchers working at Hitachi Global Storage Technologies and the University of Wisconsin have... http://www.semiconductor.net/article/201617-Sematech_EUV_Resist_at_22_nm_Half_Pitch.php?rssid=20226 http://www.semiconductor.net/article/201617-Sematech_EUV_Resist_at_22_nm_Half_Pitch.php?rssid=20226 Tue, 12 Aug 2008 15:11:00 GMT Sematech said researchers working at its Resist Test Center have demonstrated a chemically... http://www.semiconductor.net/article/204330-Carl_Zeiss_SMT_to_Acquire_Israeli_Start_Up_Pixer_Technology.php?rssid=20226 http://www.semiconductor.net/article/204330-Carl_Zeiss_SMT_to_Acquire_Israeli_Start_Up_Pixer_Technology.php?rssid=20226 Thu, 07 Aug 2008 15:20:00 GMT Carl Zeiss SMT is acquiring Pixer Technology Ltd., a 30-person company that offers photomask... http://www.semiconductor.net/article/204275-Chrome_Going_the_Way_of_the_Dodo_Bird_.php?rssid=20226 http://www.semiconductor.net/article/204275-Chrome_Going_the_Way_of_the_Dodo_Bird_.php?rssid=20226 Tue, 29 Jul 2008 16:09:00 GMT Chrome will be replaced by molybdenum silicide (MoSi) on masks starting at the 32 nm logic... http://www.semiconductor.net/article/203668-Double_Patterning_Battles_Cost_Complexity.php?rssid=20226 http://www.semiconductor.net/article/203668-Double_Patterning_Battles_Cost_Complexity.php?rssid=20226 Thu, 17 Jul 2008 16:00:00 GMT This year’s Sokudo Lithography Breakfast Forum focused on the challenges of double patterning.... http://www.semiconductor.net/article/205962-Self_Aligned_Double_Patterning_Coming.php?rssid=20226 http://www.semiconductor.net/article/205962-Self_Aligned_Double_Patterning_Coming.php?rssid=20226 Thu, 17 Jul 2008 14:00:00 GMT Applied Materials Inc. (Santa Clara, Calif.) announced several new tools at SEMICON West, and... http://www.semiconductor.net/article/196660-Lithography_Picture_Looks_Pretty_Grim_for_22_nm.php?rssid=20226 http://www.semiconductor.net/article/196660-Lithography_Picture_Looks_Pretty_Grim_for_22_nm.php?rssid=20226 Wed, 16 Jul 2008 16:00:00 GMT The key questions posed at an afternoon session at SEMICON West were “Lithography for 22 nm:... http://www.semiconductor.net/article/207695-In_Battle_Against_Haze_Rave_Wields_Rhazer.php?rssid=20226 http://www.semiconductor.net/article/207695-In_Battle_Against_Haze_Rave_Wields_Rhazer.php?rssid=20226 Tue, 15 Jul 2008 17:37:00 GMT Rave LLC has developed a prototype haze removal system, Rhazer, which can break down haze... http://www.semiconductor.net/article/203946-ASML_s_Latest_Immersion_Tool_Enables_38_nm_Memory.php?rssid=20226 http://www.semiconductor.net/article/203946-ASML_s_Latest_Immersion_Tool_Enables_38_nm_Memory.php?rssid=20226 Tue, 15 Jul 2008 06:14:00 GMT ASML’s Twinscan XT:1950i, introduced at SEMICON West, improves resolution ~5% over its... http://www.semiconductor.net/article/207509-Etcher_Tuned_for_Double_Patterning_Advanced_Gates.php?rssid=20226 http://www.semiconductor.net/article/207509-Etcher_Tuned_for_Double_Patterning_Advanced_Gates.php?rssid=20226 Sun, 13 Jul 2008 23:25:00 GMT Lam introduced the Versys Kiyo3x Conductor etch platform, the capabilities of which can be... http://www.semiconductor.net/article/197814-Cymer_s_Year_End_EUV_Goal_A_Full_Shift.php?rssid=20226 http://www.semiconductor.net/article/197814-Cymer_s_Year_End_EUV_Goal_A_Full_Shift.php?rssid=20226 Wed, 09 Jul 2008 15:51:00 GMT Cymer seeks eight hours of continuous operation for its laser-produced plasma source for EUV... http://www.semiconductor.net/article/199164-Rohm_and_Haas_Opens_Immersion_R_D_Facility.php?rssid=20226 http://www.semiconductor.net/article/199164-Rohm_and_Haas_Opens_Immersion_R_D_Facility.php?rssid=20226 Tue, 08 Jul 2008 15:03:00 GMT Rohm and Haas Electronic Materials opened an R&D facility to develop materials used in 193 nm... http://www.semiconductor.net/article/206751-Obducat_Rolls_Sindre_for_Patterned_Media.php?rssid=20226 http://www.semiconductor.net/article/206751-Obducat_Rolls_Sindre_for_Patterned_Media.php?rssid=20226 Mon, 07 Jul 2008 15:47:00 GMT Sweden’s nanoimprint lithography (NIL) vendor Obducat AB is competing for the nascent market... http://www.semiconductor.net/article/197904-Austria_Launches_Nanoimprint_Lithography_Project.php?rssid=20226 http://www.semiconductor.net/article/197904-Austria_Launches_Nanoimprint_Lithography_Project.php?rssid=20226 Wed, 02 Jul 2008 16:38:00 GMT The Austrian government will fund a series of nanoimprint lithography (NIL) research projects.... http://www.semiconductor.net/article/202010-Dow_Corning_Spins_E_Beam_Resist.php?rssid=20226 http://www.semiconductor.net/article/202010-Dow_Corning_Spins_E_Beam_Resist.php?rssid=20226 Tue, 24 Jun 2008 15:53:00 GMT Dow Corning Corp. is selling an e-beam resist that supports 6 nm features, with good line edge... http://www.semiconductor.net/article/197407-Applied_Materials_Looks_at_Life_Beyond_EUV.php?rssid=20226 http://www.semiconductor.net/article/197407-Applied_Materials_Looks_at_Life_Beyond_EUV.php?rssid=20226 Tue, 03 Jun 2008 13:52:00 GMT Applied Materials held its 11th annual technical symposium at the International Interconnect... http://www.semiconductor.net/article/209369-MII_Tackles_Patterned_Media_Opportunity.php?rssid=20226 http://www.semiconductor.net/article/209369-MII_Tackles_Patterned_Media_Opportunity.php?rssid=20226 Thu, 22 May 2008 15:26:00 GMT Molecular Imprints Inc. (Austin, Texas) is among the nanoimprint lithography (NIL) vendors... http://www.semiconductor.net/article/201848-Japan_Starts_EUV_Development_Project.php?rssid=20226 http://www.semiconductor.net/article/201848-Japan_Starts_EUV_Development_Project.php?rssid=20226 Thu, 22 May 2008 11:36:00 GMT An EUV development project backed by the Japanese government will tackle debris contamination,... http://www.semiconductor.net/article/202595-Maskless_E_Beam_Delivers_65_nm_Prototypes.php?rssid=20226 http://www.semiconductor.net/article/202595-Maskless_E_Beam_Delivers_65_nm_Prototypes.php?rssid=20226 Thu, 08 May 2008 17:36:00 GMT Following successful 90 nm implementation, e-Shuttle Inc. is now delivering 65 nm CMOS logic ICs... http://www.semiconductor.net/article/203667-Haze_Still_Misunderstood_Costing_Industry_1B_a_Year.php?rssid=20226 http://www.semiconductor.net/article/203667-Haze_Still_Misunderstood_Costing_Industry_1B_a_Year.php?rssid=20226 Wed, 07 May 2008 17:10:00 GMT Arguably the single largest yield detractor in the semiconductor industry, costing the industry... http://www.semiconductor.net/article/202538-Litho_Guru_Optimistic_About_Nanoimprint.php?rssid=20226 http://www.semiconductor.net/article/202538-Litho_Guru_Optimistic_About_Nanoimprint.php?rssid=20226 Wed, 30 Apr 2008 13:36:00 GMT Ben Eynon, Director of Advanced Technology Development at Samsung (Seoul, South Korea) and... http://www.semiconductor.net/article/207109-TSMC_Sketches_32_nm_Rollout_Plan_for_2009.php?rssid=20226 http://www.semiconductor.net/article/207109-TSMC_Sketches_32_nm_Rollout_Plan_for_2009.php?rssid=20226 Mon, 28 Apr 2008 15:09:00 GMT Taiwan Semiconductor Manufacturing Co. Ltd. plans to begin 32 nm production in the third quarter... http://www.semiconductor.net/article/198344-MAGIC_Program_Aims_Maskless_Lithography_at_32_nm.php?rssid=20226 http://www.semiconductor.net/article/198344-MAGIC_Program_Aims_Maskless_Lithography_at_32_nm.php?rssid=20226 Thu, 24 Apr 2008 16:38:00 GMT CEA-Leti (Grenoble, France) has officially launched a new research program on maskless... http://www.semiconductor.net/article/207901-Intel_EUV_Facts_Don_t_Add_Up_for_22_nm_in_2011.php?rssid=20226 http://www.semiconductor.net/article/207901-Intel_EUV_Facts_Don_t_Add_Up_for_22_nm_in_2011.php?rssid=20226 Tue, 22 Apr 2008 14:38:00 GMT Intel Senior Fellow Mark Bohr said EUV lithography will not be ready for volume production in... http://www.semiconductor.net/article/197415-D2I_Project_Reduces_Mask_Inspection_Time.php?rssid=20226 http://www.semiconductor.net/article/197415-D2I_Project_Reduces_Mask_Inspection_Time.php?rssid=20226 Mon, 21 Apr 2008 14:33:00 GMT Japan's national mask inspection project, Mask D2I, has figured out ways to significantly reduce... http://www.semiconductor.net/article/205337-ASML_Q1_Sales_Weaken_Slightly_but_Market_Share_Remains_Strong.php?rssid=20226 http://www.semiconductor.net/article/205337-ASML_Q1_Sales_Weaken_Slightly_but_Market_Share_Remains_Strong.php?rssid=20226 Wed, 16 Apr 2008 18:13:00 GMT In the announcement of its 1Q08 results today, ASML noted continued strong sales despite a... http://www.semiconductor.net/article/205465-EUVA_Purchases_Further_DPSS_Lasers_for_EUV_Source_Development.php?rssid=20226 http://www.semiconductor.net/article/205465-EUVA_Purchases_Further_DPSS_Lasers_for_EUV_Source_Development.php?rssid=20226 Thu, 10 Apr 2008 04:33:00 GMT Japan's EUVA has purchased further DPSS lasers from Powerlase for its work on discharge-produced... http://www.semiconductor.net/article/205985-HP_Picks_Rollable_Process_for_Cheaper_Displays.php?rssid=20226 http://www.semiconductor.net/article/205985-HP_Picks_Rollable_Process_for_Cheaper_Displays.php?rssid=20226 Tue, 08 Apr 2008 16:39:00 GMT Hewlett Packard has developed a roll-to-roll process for producing polymer electronics displays... http://www.semiconductor.net/article/203385-Obducat_Ships_Imprint_System_to_Singapore_s_DSI.php?rssid=20226 http://www.semiconductor.net/article/203385-Obducat_Ships_Imprint_System_to_Singapore_s_DSI.php?rssid=20226 Tue, 08 Apr 2008 16:00:00 GMT Obducat AB said Singapore’s Data Storage Institute has ordered an imprint lithography system... http://www.semiconductor.net/article/201077-SMEE_Shipping_Aligner_for_Back_End_Apps.php?rssid=20226 http://www.semiconductor.net/article/201077-SMEE_Shipping_Aligner_for_Back_End_Apps.php?rssid=20226 Mon, 07 Apr 2008 12:31:00 GMT Shanghai Micro Electronics Equipment Co. Ltd. (SMEE) said its alignment lithography system for... http://www.semiconductor.net/article/202317-Intel_Tackles_EUV_Mask_Cleans.php?rssid=20226 http://www.semiconductor.net/article/202317-Intel_Tackles_EUV_Mask_Cleans.php?rssid=20226 Wed, 02 Apr 2008 16:24:00 GMT At Sematech’s Surface Preparation and Cleaning Conference in Austin, Texas, Intel’s Ted... http://www.semiconductor.net/article/197064-SEMI_Event_Blends_Nostalgia_With_a_Look_to_the_Future.php?rssid=20226 http://www.semiconductor.net/article/197064-SEMI_Event_Blends_Nostalgia_With_a_Look_to_the_Future.php?rssid=20226 Wed, 02 Apr 2008 14:04:00 GMT SEMI event remembers industry beginnings, ponders the... http://www.semiconductor.net/article/203390-Litho_a_Major_Metrology_Challenge.php?rssid=20226 http://www.semiconductor.net/article/203390-Litho_a_Major_Metrology_Challenge.php?rssid=20226 Wed, 19 Mar 2008 06:00:00 GMT According to the International Technology Roadmap for Semiconductors (ITRS), litho is... http://www.semiconductor.net/article/203529-Software_Giants_and_Startups_Tackle_Lithography_Complexity.php?rssid=20226 http://www.semiconductor.net/article/203529-Software_Giants_and_Startups_Tackle_Lithography_Complexity.php?rssid=20226 Thu, 13 Mar 2008 05:30:00 GMT Every year at the SPIE Advanced Lithography conference, the EDA sector seems to gain a little... http://www.semiconductor.net/article/207222-Reference_Metrology_Standards_The_Looming_Nanotech_Crisis.php?rssid=20226 http://www.semiconductor.net/article/207222-Reference_Metrology_Standards_The_Looming_Nanotech_Crisis.php?rssid=20226 Wed, 12 Mar 2008 06:00:00 GMT At the SPIE Advanced Lithography Conference recently held in San Jose, a panel discussion on... http://www.semiconductor.net/article/203954-IBM_Brings_Hitachi_Into_Albany_Ecosystem.php?rssid=20226 http://www.semiconductor.net/article/203954-IBM_Brings_Hitachi_Into_Albany_Ecosystem.php?rssid=20226 Tue, 11 Mar 2008 10:29:00 GMT IBM and Hitachi researchers will work together on metrology challenges arising at the 22 nm node... http://www.semiconductor.net/article/203629-AMD_Demos_45_nm_Processors_at_CeBit.php?rssid=20226 http://www.semiconductor.net/article/203629-AMD_Demos_45_nm_Processors_at_CeBit.php?rssid=20226 Tue, 04 Mar 2008 14:20:00 GMT AMD said it has demonstrated quad-core processors manufactured at 45 nm design rules at the... http://www.semiconductor.net/article/197586-LuAG_Other_High_Index_Immersion_Elements_Get_Needed_Boost.php?rssid=20226 http://www.semiconductor.net/article/197586-LuAG_Other_High_Index_Immersion_Elements_Get_Needed_Boost.php?rssid=20226 Fri, 29 Feb 2008 11:26:00 GMT Prospects have been relatively dim for the feasibility of high-index immersion lithography in... http://www.semiconductor.net/article/200923-Applied_Materials_Patterning_Requires_Innovative_Metrology.php?rssid=20226 http://www.semiconductor.net/article/200923-Applied_Materials_Patterning_Requires_Innovative_Metrology.php?rssid=20226 Thu, 28 Feb 2008 13:58:00 GMT Applied Materials (Santa Clara, Calif.) concurrently held its 12th Annual Technology Forum with... http://www.semiconductor.net/article/204797-Mapper_Receives_Subsidy_From_EU_s_Magic_Program.php?rssid=20226 http://www.semiconductor.net/article/204797-Mapper_Receives_Subsidy_From_EU_s_Magic_Program.php?rssid=20226 Wed, 27 Feb 2008 14:54:00 GMT Mapper Lithography (Delft, Netherlands) said it has received a €3.5M subsidy from the European... http://www.semiconductor.net/article/201787-Imprint_Lithography_Moves_Closer_to_CMOS_Requirements.php?rssid=20226 http://www.semiconductor.net/article/201787-Imprint_Lithography_Moves_Closer_to_CMOS_Requirements.php?rssid=20226 Mon, 25 Feb 2008 18:43:00 GMT At the SPIE Advanced Lithography conference, Molecular Imprints Inc. introduced the Imprio 300,... http://www.semiconductor.net/article/208190-Sematech_and_Zeiss_Report_Progress_on_Mask_Metrology_Tool.php?rssid=20226 http://www.semiconductor.net/article/208190-Sematech_and_Zeiss_Report_Progress_on_Mask_Metrology_Tool.php?rssid=20226 Mon, 25 Feb 2008 15:14:00 GMT Carl Zeiss and Sematech engineers have completed the design portion of a mask metrology tool... http://www.semiconductor.net/article/200453-Rohm_and_Haas_IBM_Tackle_Implant_Level_Lithography_Materials.php?rssid=20226 http://www.semiconductor.net/article/200453-Rohm_and_Haas_IBM_Tackle_Implant_Level_Lithography_Materials.php?rssid=20226 Mon, 25 Feb 2008 12:45:00 GMT Rohm and Haas Electronic Materials has entered into a joint development agreement with IBM to... http://www.semiconductor.net/article/199102-Double_Patterning_Drives_Computational_Upgrades.php?rssid=20226 http://www.semiconductor.net/article/199102-Double_Patterning_Drives_Computational_Upgrades.php?rssid=20226 Mon, 25 Feb 2008 12:30:00 GMT Brion Technologies (Santa Clara, Calif.) today introduced both a platform upgrade and a new... http://www.semiconductor.net/article/206975-Schott_Claims_Progress_in_LuAG_Absorption_for_High_Index_Lithography.php?rssid=20226 http://www.semiconductor.net/article/206975-Schott_Claims_Progress_in_LuAG_Absorption_for_High_Index_Lithography.php?rssid=20226 Fri, 22 Feb 2008 19:50:00 GMT In a boost for high-index lithography, Schott Lithotec (Jena, Germany) said it has made... http://www.semiconductor.net/article/206096-Nikon_Plans_Double_Patterning_Scanner_by_Fourth_Quarter.php?rssid=20226 http://www.semiconductor.net/article/206096-Nikon_Plans_Double_Patterning_Scanner_by_Fourth_Quarter.php?rssid=20226 Wed, 20 Feb 2008 15:14:00 GMT Nikon Corp. said that it will begin selling an immersion ArF scanner by the fourth quarter,... http://www.semiconductor.net/article/202629-EUV_Research_Helps_Solve_193_nm_Resist_Problems.php?rssid=20226 http://www.semiconductor.net/article/202629-EUV_Research_Helps_Solve_193_nm_Resist_Problems.php?rssid=20226 Wed, 06 Feb 2008 14:21:00 GMT Leading-edge research into the requirements for EUV photoresists is helping to solve some of the... http://www.semiconductor.net/article/207352-Researchers_Develop_Forward_Looking_Polymer_With_Immediate_Applications.php?rssid=20226 http://www.semiconductor.net/article/207352-Researchers_Develop_Forward_Looking_Polymer_With_Immediate_Applications.php?rssid=20226 Mon, 04 Feb 2008 14:57:00 GMT A team led by researchers from Rensselaer Polytechnic Institute has developed a polymer that... http://www.semiconductor.net/article/201659-Roadmap_Dictated_by_Flash_More_Than_Moore.php?rssid=20226 http://www.semiconductor.net/article/201659-Roadmap_Dictated_by_Flash_More_Than_Moore.php?rssid=20226 Fri, 25 Jan 2008 15:41:00 GMT The 2007 edition of the International Technology Roadmap for Semiconductors (ITRS) projects the... http://www.semiconductor.net/article/200749-Sematech_Announces_Meetings_Lineup_for_2008.php?rssid=20226 http://www.semiconductor.net/article/200749-Sematech_Announces_Meetings_Lineup_for_2008.php?rssid=20226 Thu, 24 Jan 2008 16:34:00 GMT Sematech announced its 2008 meetings on lithography and other semiconductor-related research... http://www.semiconductor.net/article/199749-Albany_NanoTech_and_IMEC_to_Collaborate_on_EUV_Lithography_Research.php?rssid=20226 http://www.semiconductor.net/article/199749-Albany_NanoTech_and_IMEC_to_Collaborate_on_EUV_Lithography_Research.php?rssid=20226 Tue, 22 Jan 2008 12:41:00 GMT The University of Albany’s College of Nanoscale Science and Engineering and IMEC will... http://www.semiconductor.net/article/206598-Litho_Faces_Daunting_Materials_Hurdles.php?rssid=20226 http://www.semiconductor.net/article/206598-Litho_Faces_Daunting_Materials_Hurdles.php?rssid=20226 Fri, 18 Jan 2008 12:54:00 GMT Bryan Rice, Sematech’s immersion lithography program manager, outlined the materials... http://www.semiconductor.net/article/204812-Canon_Immersion_Scanner_Uses_Twin_Stage_Pipeline_Scheme.php?rssid=20226 http://www.semiconductor.net/article/204812-Canon_Immersion_Scanner_Uses_Twin_Stage_Pipeline_Scheme.php?rssid=20226 Mon, 17 Dec 2007 15:45:00 GMT Canon Inc. (Tokyo) disclosed some details of its long-awaited AS-7 ArF immersion scanner. The... http://www.semiconductor.net/article/206535-Sematech_Lack_of_Litho_Reference_Measurements_a_Concern.php?rssid=20226 http://www.semiconductor.net/article/206535-Sematech_Lack_of_Litho_Reference_Measurements_a_Concern.php?rssid=20226 Fri, 14 Dec 2007 18:30:00 GMT With the industry inexorably headed toward the 32 nm node, lithography increasingly faces... http://www.semiconductor.net/article/202733-JSR_and_IBM_Collaborate_on_Next_Gen_Lithography_Self_Assembly.php?rssid=20226 http://www.semiconductor.net/article/202733-JSR_and_IBM_Collaborate_on_Next_Gen_Lithography_Self_Assembly.php?rssid=20226 Fri, 07 Dec 2007 21:23:00 GMT JSR Micro Inc. announced in Japan today that it has entered a joint research agreement with IBM... http://www.semiconductor.net/article/201940-Photronics_Sees_Revenue_Decline_in_2007_With_Growth_Potential_in_2008.php?rssid=20226 http://www.semiconductor.net/article/201940-Photronics_Sees_Revenue_Decline_in_2007_With_Growth_Potential_in_2008.php?rssid=20226 Wed, 05 Dec 2007 20:51:00 GMT Photomask supplier Photronics Inc. reported fiscal 2007 fourth quarter and fiscal year results... http://www.semiconductor.net/article/197460-Cymer_100_W_EUV_Source_Is_on_Track.php?rssid=20226 http://www.semiconductor.net/article/197460-Cymer_100_W_EUV_Source_Is_on_Track.php?rssid=20226 Mon, 03 Dec 2007 16:03:00 GMT Cymer Inc. (San Diego) said it has reached the 100 W level for its EUV source module, needed for... http://www.semiconductor.net/article/200670-Fullerene_C60_Said_to_Boost_Photoresist.php?rssid=20226 http://www.semiconductor.net/article/200670-Fullerene_C60_Said_to_Boost_Photoresist.php?rssid=20226 Mon, 26 Nov 2007 15:57:00 GMT A Tokyo-based nanotechnology company said it has incorporated fullerene molecules into an ArF... http://www.semiconductor.net/article/201410-S_E_T_Intros_Bonder_for_3_D_Nanoimprint.php?rssid=20226 http://www.semiconductor.net/article/201410-S_E_T_Intros_Bonder_for_3_D_Nanoimprint.php?rssid=20226 Wed, 14 Nov 2007 14:37:00 GMT The latest product to result from the partnership between S.E.T. and CEA-Leti is FC300, a new... http://www.semiconductor.net/article/206308-Kovio_Inkjet_Prints_Fast_Silicon_Transistor.php?rssid=20226 http://www.semiconductor.net/article/206308-Kovio_Inkjet_Prints_Fast_Silicon_Transistor.php?rssid=20226 Wed, 14 Nov 2007 13:00:00 GMT In a claimed breakthrough for printed electronics, Kovio Inc.(Sunnyvale, Calif.) announced that... http://www.semiconductor.net/article/201041-EUVL_Results_Show_Promise_But_Still_Many_Challenges.php?rssid=20226 http://www.semiconductor.net/article/201041-EUVL_Results_Show_Promise_But_Still_Many_Challenges.php?rssid=20226 Fri, 09 Nov 2007 21:19:00 GMT Upon his return from the EUVL Symposium in Sapporo, Japan, Sematech’s lithography director... http://www.semiconductor.net/article/202181-Lithography_Test_Among_Cost_Challenges.php?rssid=20226 http://www.semiconductor.net/article/202181-Lithography_Test_Among_Cost_Challenges.php?rssid=20226 Thu, 08 Nov 2007 15:26:00 GMT Equipment productivity has skyrocketed over the past five years, as measured by slices per hour,... http://www.semiconductor.net/article/199567-_Templating_Used_For_Self_Assembled_Qubits.php?rssid=20226 http://www.semiconductor.net/article/199567-_Templating_Used_For_Self_Assembled_Qubits.php?rssid=20226 Thu, 01 Nov 2007 14:52:00 GMT A University of Maryland materials scientist has developed a templating approach to... http://www.semiconductor.net/article/203376-Sematech_Researchers_to_Report_Progress_at_EUVL_Symposium.php?rssid=20226 http://www.semiconductor.net/article/203376-Sematech_Researchers_to_Report_Progress_at_EUVL_Symposium.php?rssid=20226 Mon, 29 Oct 2007 15:51:00 GMT Sematech researchers will present progress in EUV lithography mask blank defect reduction,... http://www.semiconductor.net/article/203560-Double_Patterning_Leads_Race_for_32_nm.php?rssid=20226 http://www.semiconductor.net/article/203560-Double_Patterning_Leads_Race_for_32_nm.php?rssid=20226 Thu, 18 Oct 2007 13:51:00 GMT At its annual review meeting earlier this week, IMEC announced its intention to install a... http://www.semiconductor.net/article/205946-IMEC_to_Acquire_EUV_Pre_Production_Tool_From_ASML.php?rssid=20226 http://www.semiconductor.net/article/205946-IMEC_to_Acquire_EUV_Pre_Production_Tool_From_ASML.php?rssid=20226 Tue, 16 Oct 2007 15:16:00 GMT IMEC plans to install an ASML EUV pre-production tool in 2010, enabling 22 nm CMOS development.... http://www.semiconductor.net/article/208523-E_Shuttle_Bets_on_E_Beam_Direct_Writing.php?rssid=20226 http://www.semiconductor.net/article/208523-E_Shuttle_Bets_on_E_Beam_Direct_Writing.php?rssid=20226 Tue, 16 Oct 2007 11:49:00 GMT E-Shuttle provides electron-beam direct writing to customers seeking prototypes and small-volume... http://www.semiconductor.net/article/196426-Toshiba_Validates_Imprint_Lithography_for_32_nm.php?rssid=20226 http://www.semiconductor.net/article/196426-Toshiba_Validates_Imprint_Lithography_for_32_nm.php?rssid=20226 Tue, 16 Oct 2007 10:30:00 GMT About six months after its acceptance of Molecular Imprints’ Imprio 250, Toshiba has... http://www.semiconductor.net/article/202734-High_Index_Lens_Lags_Roadmap_by_Several_Months.php?rssid=20226 http://www.semiconductor.net/article/202734-High_Index_Lens_Lags_Roadmap_by_Several_Months.php?rssid=20226 Wed, 10 Oct 2007 23:21:00 GMT Although researchers at Schott Lithotec have made progress in developing lens materials for... http://www.semiconductor.net/article/209046-CEA_Leti_Orders_Vistec_E_Beam.php?rssid=20226 http://www.semiconductor.net/article/209046-CEA_Leti_Orders_Vistec_E_Beam.php?rssid=20226 Wed, 10 Oct 2007 09:26:00 GMT The French public research center CEA-Leti said it has installed a direct-write e-beam system... http://www.semiconductor.net/article/201992-Developers_Call_for_Backing_of_High_Index_Immersion_Lithography.php?rssid=20226 http://www.semiconductor.net/article/201992-Developers_Call_for_Backing_of_High_Index_Immersion_Lithography.php?rssid=20226 Wed, 10 Oct 2007 05:36:00 GMT Panelists at this year’s International Symposium on Immersion Lithography debated the... http://www.semiconductor.net/article/198482-Gigaphoton_in_High_NA_Scanner.php?rssid=20226 http://www.semiconductor.net/article/198482-Gigaphoton_in_High_NA_Scanner.php?rssid=20226 Tue, 02 Oct 2007 10:30:00 GMT Gigaphoton Inc. said its newest ArF excimer laser light source, aimed at immersion systems with... http://www.semiconductor.net/article/206627-Brion_Intros_Advanced_Fruits_of_ASML_Merger.php?rssid=20226 http://www.semiconductor.net/article/206627-Brion_Intros_Advanced_Fruits_of_ASML_Merger.php?rssid=20226 Tue, 18 Sep 2007 16:47:00 GMT Brion Technologies Inc. today announced it has added significant options to two key product... http://www.semiconductor.net/article/198612-Toppan_and_CEA_Leti_Collaborate_on_Double_Patterning.php?rssid=20226 http://www.semiconductor.net/article/198612-Toppan_and_CEA_Leti_Collaborate_on_Double_Patterning.php?rssid=20226 Tue, 18 Sep 2007 06:00:00 GMT Toppan Photomasks and CEA-Leti have signed a joint development agreement to explore double... http://www.semiconductor.net/article/209292-Mapper_Demos_Massively_Parallel_E_Beam_Lithography.php?rssid=20226 http://www.semiconductor.net/article/209292-Mapper_Demos_Massively_Parallel_E_Beam_Lithography.php?rssid=20226 Thu, 13 Sep 2007 17:09:00 GMT Mapper Lithography said it has reached a milestone demonstration of massively parallel... http://www.semiconductor.net/article/202051-Lighter_Gas_Reduces_Damage_to_EUVL_Optics.php?rssid=20226 http://www.semiconductor.net/article/202051-Lighter_Gas_Reduces_Damage_to_EUVL_Optics.php?rssid=20226 Wed, 12 Sep 2007 16:41:00 GMT Researchers at the University of Illinois (Urbana-Champaign, Ill.) have discovered a way to... http://www.semiconductor.net/article/207812-New_Etch_Processes_Target_Nanoimprint_Lithography.php?rssid=20226 http://www.semiconductor.net/article/207812-New_Etch_Processes_Target_Nanoimprint_Lithography.php?rssid=20226 Wed, 12 Sep 2007 15:21:00 GMT Oxford Instruments and NIL Technology have jointly developed processes for the etching of... http://www.semiconductor.net/article/199629-IBM_Zurich_Prints_Nanoscale_Particles.php?rssid=20226 http://www.semiconductor.net/article/199629-IBM_Zurich_Prints_Nanoscale_Particles.php?rssid=20226 Tue, 11 Sep 2007 20:48:00 GMT IBM's Zurich Research Laboratory has developed a nanoprinting method that uses a self-assembly... http://www.semiconductor.net/article/200160-Rohm_Haas_Orders_SUSS_Tool_for_Materials_Development.php?rssid=20226 http://www.semiconductor.net/article/200160-Rohm_Haas_Orders_SUSS_Tool_for_Materials_Development.php?rssid=20226 Tue, 11 Sep 2007 17:01:00 GMT SUSS MicroTec received an initial order from Rohm and Haas Electronic Materials for its Gamma... http://www.semiconductor.net/article/200056-Illinois_Team_Advances_Resolution_of_E_Jet_Printing.php?rssid=20226 http://www.semiconductor.net/article/200056-Illinois_Team_Advances_Resolution_of_E_Jet_Printing.php?rssid=20226 Thu, 06 Sep 2007 20:40:00 GMT University of Illinois researchers said they have improved jet printing techniques that can be... http://www.semiconductor.net/article/200849-Vistec_Lands_E_Beam_Litho_at_German_Center.php?rssid=20226 http://www.semiconductor.net/article/200849-Vistec_Lands_E_Beam_Litho_at_German_Center.php?rssid=20226 Wed, 22 Aug 2007 14:54:00 GMT Vistec Lithography Inc. said it has installed an electron-beam lithography system at German... http://www.semiconductor.net/article/198931-Cadence_Acquires_Clear_Shape_Technologies.php?rssid=20226 http://www.semiconductor.net/article/198931-Cadence_Acquires_Clear_Shape_Technologies.php?rssid=20226 Thu, 16 Aug 2007 19:10:00 GMT Cadence Design Systems Inc. announced that it is acquiring Clear Shape Technologies Inc. to... http://www.semiconductor.net/article/197547-SUSS_Coater_Chosen_by_HD_MicroSystems.php?rssid=20226 http://www.semiconductor.net/article/197547-SUSS_Coater_Chosen_by_HD_MicroSystems.php?rssid=20226 Tue, 14 Aug 2007 14:23:00 GMT SUSS MicroTec said HD MicroSystems, a joint venture between Hitachi Chemical Co. Ltd. and DuPont... http://www.semiconductor.net/article/196547-AMTC_Qualifies_Vistec_Metrology_System.php?rssid=20226 http://www.semiconductor.net/article/196547-AMTC_Qualifies_Vistec_Metrology_System.php?rssid=20226 Tue, 14 Aug 2007 13:04:00 GMT The Advanced Mask Technology Center has qualified the Vistec mask metrology system, the LMS... http://www.semiconductor.net/article/199700-Cymer_Gains_XLR_Win_in_Double_Patterning_ASML_Scanner.php?rssid=20226 http://www.semiconductor.net/article/199700-Cymer_Gains_XLR_Win_in_Double_Patterning_ASML_Scanner.php?rssid=20226 Thu, 26 Jul 2007 20:51:00 GMT Cymer Inc. CEO Bob Akins Thursday said his company received a pleasant surprise when lithography... http://www.semiconductor.net/article/199606-Cymer_ArF_Immersion_Sources_Drove_Strong_Q2_Financials.php?rssid=20226 http://www.semiconductor.net/article/199606-Cymer_ArF_Immersion_Sources_Drove_Strong_Q2_Financials.php?rssid=20226 Thu, 26 Jul 2007 20:00:00 GMT Cymer Inc. (San Diego) announced stellar second-quarter operating results Thursday, with net... http://www.semiconductor.net/article/203364-Carl_Zeiss_Names_Corning_as_a_Supply_Chain_Partner.php?rssid=20226 http://www.semiconductor.net/article/203364-Carl_Zeiss_Names_Corning_as_a_Supply_Chain_Partner.php?rssid=20226 Tue, 24 Jul 2007 15:12:00 GMT Optics supplier Carl Zeiss SMT (Oberkochen, Germany) has named its optical material supplier,... http://www.semiconductor.net/article/198594-Cymer_Is_ASML_s_Source_Supplier_for_Volume_EUV_Scanners.php?rssid=20226 http://www.semiconductor.net/article/198594-Cymer_Is_ASML_s_Source_Supplier_for_Volume_EUV_Scanners.php?rssid=20226 Fri, 20 Jul 2007 10:44:00 GMT Cymer announced at SEMICON West 2007 that it will be the EUV source supplier for ASML, a... http://www.semiconductor.net/article/206057-Track_Scanner_Push_for_Litho_Productivity.php?rssid=20226 http://www.semiconductor.net/article/206057-Track_Scanner_Push_for_Litho_Productivity.php?rssid=20226 Thu, 19 Jul 2007 06:00:00 GMT At yesterday’s Sokudo Lithography Breakfast Forum, industry experts focused on lithocell... http://www.semiconductor.net/article/197266-ASML_Shipping_1900i_Developing_High_NA_KrF_Scanner_for_Mid_2008_Release.php?rssid=20226 http://www.semiconductor.net/article/197266-ASML_Shipping_1900i_Developing_High_NA_KrF_Scanner_for_Mid_2008_Release.php?rssid=20226 Wed, 18 Jul 2007 20:46:00 GMT ASML Holding NV (Veldhoven, Netherlands) made SEMICON West lithography news at both the ArF and... http://www.semiconductor.net/article/208701-Challenges_of_Preparing_for_32_22_nm.php?rssid=20226 http://www.semiconductor.net/article/208701-Challenges_of_Preparing_for_32_22_nm.php?rssid=20226 Wed, 18 Jul 2007 06:00:00 GMT With 65 nm manufacturing a reality and 45 nm on the near horizon, IDMs and equipment/materials... http://www.semiconductor.net/article/202266-Cadence_Acquisition_of_Invarium_Could_Change_DFM_Market.php?rssid=20226 http://www.semiconductor.net/article/202266-Cadence_Acquisition_of_Invarium_Could_Change_DFM_Market.php?rssid=20226 Thu, 12 Jul 2007 20:37:00 GMT Cadence Design Systems Inc., until now an also-ran in the market for DFM implementation... http://www.semiconductor.net/article/205699-Europe_s_EUV_Research_Project_More_Moore_Comes_to_a_Close.php?rssid=20226 http://www.semiconductor.net/article/205699-Europe_s_EUV_Research_Project_More_Moore_Comes_to_a_Close.php?rssid=20226 Thu, 12 Jul 2007 12:25:00 GMT The research project, funded by the European Commission to promote European development of... http://www.semiconductor.net/article/199560-JEOL_Aims_Direct_Write_E_Beam_System_at_Academics.php?rssid=20226 http://www.semiconductor.net/article/199560-JEOL_Aims_Direct_Write_E_Beam_System_at_Academics.php?rssid=20226 Tue, 10 Jul 2007 19:41:00 GMT JEOL USA (Peabody, Mass.) today announced a direct-write e-beam lithography system targeted at... http://www.semiconductor.net/article/196981-Audio_Interview_More_Faith_Put_in_EUV_Not_High_Index.php?rssid=20226 http://www.semiconductor.net/article/196981-Audio_Interview_More_Faith_Put_in_EUV_Not_High_Index.php?rssid=20226 Fri, 02 Mar 2007 07:00:00 GMT Wrapping up the week at SPIE’s Advanced Lithography conference, Aaron Hand, executive editor,... http://www.semiconductor.net/article/199045-Audio_Interview_SPIE_Fellow_Provides_High_Index_Double_Patterning_Insight.php?rssid=20226 http://www.semiconductor.net/article/199045-Audio_Interview_SPIE_Fellow_Provides_High_Index_Double_Patterning_Insight.php?rssid=20226 Fri, 02 Mar 2007 07:00:00 GMT ... http://www.semiconductor.net/article/202865-Transcript_More_Faith_Put_in_EUV_Not_High_Index.php?rssid=20226 http://www.semiconductor.net/article/202865-Transcript_More_Faith_Put_in_EUV_Not_High_Index.php?rssid=20226 Fri, 02 Mar 2007 07:00:00 GMT ... http://www.semiconductor.net/article/208625-Transcript_SPIE_Fellow_Provides_High_Index_Double_Patterning_Insight.php?rssid=20226 http://www.semiconductor.net/article/208625-Transcript_SPIE_Fellow_Provides_High_Index_Double_Patterning_Insight.php?rssid=20226 Fri, 02 Mar 2007 07:00:00 GMT ... http://www.semiconductor.net/article/200328-Audio_Interview_Expert_Panel_Debates_Challenges_of_Double_Patterning.php?rssid=20226 http://www.semiconductor.net/article/200328-Audio_Interview_Expert_Panel_Debates_Challenges_of_Double_Patterning.php?rssid=20226 Wed, 28 Feb 2007 07:00:00 GMT Advanced Lithography: Senior Editor Alexander E. Braun interviewed Invarium's CTO, Apo... http://www.semiconductor.net/article/202679-Audio_Interview_Memory_vs_Logic_a_Maskmaker_s_Perspective.php?rssid=20226 http://www.semiconductor.net/article/202679-Audio_Interview_Memory_vs_Logic_a_Maskmaker_s_Perspective.php?rssid=20226 Wed, 28 Feb 2007 07:00:00 GMT Advanced Lithography: Aaron Hand, Executive Editor, Electronic Media, met with Chris Progler,... http://www.semiconductor.net/article/203423-Transcript_Memory_vs_Logic_a_Maskmaker_s_Perspective.php?rssid=20226 http://www.semiconductor.net/article/203423-Transcript_Memory_vs_Logic_a_Maskmaker_s_Perspective.php?rssid=20226 Wed, 28 Feb 2007 07:00:00 GMT ... http://www.semiconductor.net/article/207567-Nikon_Ships_45_nm_Production_Immersion_Scanner.php?rssid=20226 http://www.semiconductor.net/article/207567-Nikon_Ships_45_nm_Production_Immersion_Scanner.php?rssid=20226 Wed, 28 Feb 2007 07:00:00 GMT Nikon has shipped a 45 nm capable immersion lithography system to a major IC manufacturer. The... http://www.semiconductor.net/article/207610-Nikon_and_CEA_Leti_Partner_on_Double_Patterning.php?rssid=20226 http://www.semiconductor.net/article/207610-Nikon_and_CEA_Leti_Partner_on_Double_Patterning.php?rssid=20226 Tue, 27 Feb 2007 07:00:00 GMT Nikon has announced a joint-development program with CEA-Leti that will examine the potential... http://www.semiconductor.net/article/208448-ASML_to_Acquire_Brion_Technologies.php?rssid=20226 http://www.semiconductor.net/article/208448-ASML_to_Acquire_Brion_Technologies.php?rssid=20226 Tue, 19 Dec 2006 20:30:00 GMT Litho tool manufacturer ASML will acquire the computational lithography tool developer for $270M... http://www.semiconductor.net/article/207038-JSR_Completes_Pilot_Production_Line_for_Next_Gen_Devices.php?rssid=20226 http://www.semiconductor.net/article/207038-JSR_Completes_Pilot_Production_Line_for_Next_Gen_Devices.php?rssid=20226 Tue, 12 Dec 2006 20:12:00 GMT JSR Corp. has announced completion of a new pilot production line to offer high-quality... http://www.semiconductor.net/article/200199-Audio_Interview_IMEC_s_Van_den_Hove_on_Lithography_Advances.php?rssid=20226 http://www.semiconductor.net/article/200199-Audio_Interview_IMEC_s_Van_den_Hove_on_Lithography_Advances.php?rssid=20226 Wed, 18 Oct 2006 06:00:00 GMT Out at IMEC’s annual research review meeting in Leuven, Belgium, this week, Senior Editor... http://www.semiconductor.net/article/207199-Audio_Interview_Zeiss_Perspective_on_Next_Generation_Lithography.php?rssid=20226 http://www.semiconductor.net/article/207199-Audio_Interview_Zeiss_Perspective_on_Next_Generation_Lithography.php?rssid=20226 Tue, 17 Oct 2006 06:00:00 GMT While in Oberkochen, Germany, for the opening of an advanced lithography optics facility at Carl... http://www.semiconductor.net/article/207397-Audio_Interview_Zeiss_Opens_Advanced_Litho_Optics_Facilities.php?rssid=20226 http://www.semiconductor.net/article/207397-Audio_Interview_Zeiss_Opens_Advanced_Litho_Optics_Facilities.php?rssid=20226 Tue, 17 Oct 2006 06:00:00 GMT Senior Editor Alexander Braun attended Carl Zeiss SMT’s opening of its advanced optics center... http://www.semiconductor.net/article/209407-Audio_Interview_Maskmaker_Discusses_Double_Patterning.php?rssid=20226 http://www.semiconductor.net/article/209407-Audio_Interview_Maskmaker_Discusses_Double_Patterning.php?rssid=20226 Thu, 28 Sep 2006 06:00:00 GMT Photomask Technology 2006: Franklin Kalk, chief technology officer at Toppan Photomasks, sat... http://www.semiconductor.net/article/206497-Nikon_and_Synopsys_Team_Up_for_Advanced_DFM_Solutions.php?rssid=20226 http://www.semiconductor.net/article/206497-Nikon_and_Synopsys_Team_Up_for_Advanced_DFM_Solutions.php?rssid=20226 Thu, 21 Sep 2006 06:00:00 GMT Photomask Technology 2006: EDA company Synopsys and lithography tool supplier Nikon have... http://www.semiconductor.net/article/201723-Audio_Interview_Photomask_Chair_Offers_Conference_Preview.php?rssid=20226 http://www.semiconductor.net/article/201723-Audio_Interview_Photomask_Chair_Offers_Conference_Preview.php?rssid=20226 Wed, 13 Sep 2006 06:00:00 GMT Managing Editor Aaron Hand speaks with Bob Naber, co-chair of this year's Photomask Technology... http://www.semiconductor.net/article/197980-Sierra_and_Mentor_Collaborate_on_Litho_Friendly_Design.php?rssid=20226 http://www.semiconductor.net/article/197980-Sierra_and_Mentor_Collaborate_on_Litho_Friendly_Design.php?rssid=20226 Tue, 01 Aug 2006 06:00:00 GMT Sierra Design Automation Inc. (Santa Clara, Calif.) is teaming up with Mentor Graphics (San... http://www.semiconductor.net/article/197929-ASML_Intros_Fifth_Generation_Immersion_Tool.php?rssid=20226 http://www.semiconductor.net/article/197929-ASML_Intros_Fifth_Generation_Immersion_Tool.php?rssid=20226 Wed, 12 Jul 2006 06:00:00 GMT With an announcement yesterday at SEMICON West, ASML introduced the Twinscan XT:1900i, its... http://www.semiconductor.net/article/204739-Extending_Immersion_Lithography_to_32_nm.php?rssid=20226 http://www.semiconductor.net/article/204739-Extending_Immersion_Lithography_to_32_nm.php?rssid=20226 Wed, 12 Jul 2006 06:00:00 GMT In a technical presentation Nikon held today at SEMICON West, Gene Fuller, principal engineer at... http://www.semiconductor.net/article/203531-NIL_Technology_Receives_New_Orders_for_Nanoimprint_Templates.php?rssid=20226 http://www.semiconductor.net/article/203531-NIL_Technology_Receives_New_Orders_for_Nanoimprint_Templates.php?rssid=20226 Wed, 14 Jun 2006 06:00:00 GMT NIL Technology has received two new orders, as well as a follow-on order, for nanoimprint... http://www.semiconductor.net/article/209243-Few_Surprises_in_Litho_Survey_Backing_of_Immersion_and_EUV.php?rssid=20226 http://www.semiconductor.net/article/209243-Few_Surprises_in_Litho_Survey_Backing_of_Immersion_and_EUV.php?rssid=20226 Fri, 26 May 2006 06:00:00 GMT Semiconductor manufacturers and their suppliers seem to be in agreement with the latest... http://www.semiconductor.net/article/207590-Double_Exposure_Key_to_Pushing_EUV_Out_Further.php?rssid=20226 http://www.semiconductor.net/article/207590-Double_Exposure_Key_to_Pushing_EUV_Out_Further.php?rssid=20226 Wed, 22 Feb 2006 07:00:00 GMT SPIE: In a plenary talk this week at SPIE Microlithography, Intel’s Yan Borodovsky indicated... http://www.semiconductor.net/article/206279-Aprio_Advances_Incremental_OPC_Strategy.php?rssid=20226 http://www.semiconductor.net/article/206279-Aprio_Advances_Incremental_OPC_Strategy.php?rssid=20226 Tue, 21 Feb 2006 07:00:00 GMT SPIE: Aprio Technologies takes an incremental approach to mask data... http://www.semiconductor.net/article/207025-Brion_Intros_Predictable_Full_Chip_OPC.php?rssid=20226 http://www.semiconductor.net/article/207025-Brion_Intros_Predictable_Full_Chip_OPC.php?rssid=20226 Tue, 21 Feb 2006 07:00:00 GMT SPIE: Several companies are working on improving the accuracy of their OPC models. Brion... http://www.semiconductor.net/article/200204-IBM_and_JSR_Prove_Immersion_s_Extension_Beyond_32_nm.php?rssid=20226 http://www.semiconductor.net/article/200204-IBM_and_JSR_Prove_Immersion_s_Extension_Beyond_32_nm.php?rssid=20226 Mon, 20 Feb 2006 07:00:00 GMT SPIE: IBM and JSR Corp. announced today their joint achievement in producing sub-30 nm features... http://www.semiconductor.net/article/199917-Company_News.php?rssid=20226 http://www.semiconductor.net/article/199917-Company_News.php?rssid=20226 Tue, 01 Feb 2005 07:00:00 GMT ... http://www.semiconductor.net/article/198119-Company_News.php?rssid=20226 http://www.semiconductor.net/article/198119-Company_News.php?rssid=20226 Mon, 01 Nov 2004 07:00:00 GMT ... http://www.semiconductor.net/article/208945-Company_News.php?rssid=20226 http://www.semiconductor.net/article/208945-Company_News.php?rssid=20226 Sun, 01 Feb 2004 07:00:00 GMT ... http://www.semiconductor.net/article/201243-The_Annual_Desk_Clearing_Lithography_News_Roundup.php?rssid=20226 http://www.semiconductor.net/article/201243-The_Annual_Desk_Clearing_Lithography_News_Roundup.php?rssid=20226 Sun, 01 Sep 2002 06:00:00 GMT In case you haven't heard, Semiconductor International moved its main executive/editorial office... http://www.semiconductor.net/article/208627-Start_up_Company_Exploits_Maskless_Photolithography_Technique.php?rssid=20226 http://www.semiconductor.net/article/208627-Start_up_Company_Exploits_Maskless_Photolithography_Technique.php?rssid=20226 Wed, 01 Aug 2001 06:00:00 GMT Armed with a maskless technique called Smart Filter Technology, a new company has entered the... http://www.semiconductor.net/article/199485-Copper_Calls_for_New_Alignment_Schemes.php?rssid=20226 http://www.semiconductor.net/article/199485-Copper_Calls_for_New_Alignment_Schemes.php?rssid=20226 Sun, 01 Jul 2001 06:00:00 GMT The industry's move toward dual-damascene copper architectures brings with it a wide array of... http://www.semiconductor.net/article/199947-Putting_EUV_Optics_to_the_Test.php?rssid=20226 http://www.semiconductor.net/article/199947-Putting_EUV_Optics_to_the_Test.php?rssid=20226 Sun, 01 Jul 2001 06:00:00 GMT One of the most promising candidates for next-generation lithography is the use of EUV radiation... http://www.semiconductor.net/article/198704-AMD_Employs_ESD_Control_for_Photomasks.php?rssid=20226 http://www.semiconductor.net/article/198704-AMD_Employs_ESD_Control_for_Photomasks.php?rssid=20226 Fri, 01 Jun 2001 06:00:00 GMT Advanced Micro Devices (AMD, Sunnyvale, Calif.) is successfully using an ESD (electrostatic... http://www.semiconductor.net/article/207227-EUV_Lithography_Makes_Serious_Progress.php?rssid=20226 http://www.semiconductor.net/article/207227-EUV_Lithography_Makes_Serious_Progress.php?rssid=20226 Fri, 01 Jun 2001 06:00:00 GMT The semiconductor industry really seems to be approaching extreme ultraviolet (EUV) lithography... http://www.semiconductor.net/article/201648-Ready_or_Not_When_Will_157_Really_Be_Needed_.php?rssid=20226 http://www.semiconductor.net/article/201648-Ready_or_Not_When_Will_157_Really_Be_Needed_.php?rssid=20226 Tue, 01 May 2001 06:00:00 GMT Faced with the question, "Will 157 nm lithography be ready by 2005?" the answer is rarely a... http://www.semiconductor.net/article/208082-Panelists_Debate_Concerns_About_Reticle_Defects.php?rssid=20226 http://www.semiconductor.net/article/208082-Panelists_Debate_Concerns_About_Reticle_Defects.php?rssid=20226 Sun, 01 Apr 2001 07:00:00 GMT In a BACUS-hosted panel discussion about whether reticle defects would ultimately bring the... http://www.semiconductor.net/article/207289-Soft_Lithography_Prints_TFTs_on_Curved_Substrates.php?rssid=20226 http://www.semiconductor.net/article/207289-Soft_Lithography_Prints_TFTs_on_Curved_Substrates.php?rssid=20226 Thu, 01 Mar 2001 07:00:00 GMT The technical understanding that the semiconductor industry has developed regarding... http://www.semiconductor.net/article/196554-Contact_Hole_Area_Dwarfs_Corner_Rounding_in_Reticle_Considerations.php?rssid=20226 http://www.semiconductor.net/article/196554-Contact_Hole_Area_Dwarfs_Corner_Rounding_in_Reticle_Considerations.php?rssid=20226 Thu, 01 Feb 2001 07:00:00 GMT Certainly, pattern fidelity on a wafer is critical to the finished device's functionality.... http://www.semiconductor.net/article/205191-Narrowband_Laser_Provides_193_nm_Lithography_Metrology.php?rssid=20226 http://www.semiconductor.net/article/205191-Narrowband_Laser_Provides_193_nm_Lithography_Metrology.php?rssid=20226 Thu, 01 Feb 2001 07:00:00 GMT Much of today's semiconductor lithography is performed using large excimer lasers operating at... http://www.semiconductor.net/article/198268-Higher_Repetition_Rate_Makes_ArF_Laser_More_Production_Ready.php?rssid=20226 http://www.semiconductor.net/article/198268-Higher_Repetition_Rate_Makes_ArF_Laser_More_Production_Ready.php?rssid=20226 Mon, 01 Jan 2001 07:00:00 GMT Several factors are still keeping the 193 nm system from being a lithography tool for the... http://www.semiconductor.net/article/202397-SEM_Measurements_Cause_193_nm_Resist_Slimming.php?rssid=20226 http://www.semiconductor.net/article/202397-SEM_Measurements_Cause_193_nm_Resist_Slimming.php?rssid=20226 Fri, 01 Dec 2000 07:00:00 GMT At this point in the game, there are a couple of ways IC manufacturers can reach the 130 nm... http://www.semiconductor.net/article/197396-European_Team_Integrates_IPL_Process_Development_Tool.php?rssid=20226 http://www.semiconductor.net/article/197396-European_Team_Integrates_IPL_Process_Development_Tool.php?rssid=20226 Wed, 01 Nov 2000 07:00:00 GMT Despite recent estimations to the contrary, ion-beam methods are surging forward in the race for... http://www.semiconductor.net/article/197934-Reticle_Inspection_Breaks_the_100_nm_Barrier.php?rssid=20226 http://www.semiconductor.net/article/197934-Reticle_Inspection_Breaks_the_100_nm_Barrier.php?rssid=20226 Wed, 01 Nov 2000 07:00:00 GMT The industry's unwillingness to surrender 248 nm lithography continues to make reticle... http://www.semiconductor.net/article/203350-Plastic_Transistors_Formed_by_Ink_Jet_Printing.php?rssid=20226 http://www.semiconductor.net/article/203350-Plastic_Transistors_Formed_by_Ink_Jet_Printing.php?rssid=20226 Wed, 01 Nov 2000 07:00:00 GMT Can you imagine semiconductor manufacturing without expensive vacuum equipment, multiple...