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Phase-shifting masks with sub-wavelength diffractive optical elements

Patent Number: 8112726
Publication Date: 2012-02-07
Inventors: Singh, Vivek; Borodovsky, Yan; Hu, Bin

The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile ...

High resolution lithography system and method

Patent Number: 8110345
Publication Date: 2012-02-07
Inventors: Lin, Burn Jeng; Lin, Chin-Hsiang

Provided are a high resolution lithography system and method. In one example, a method for producing a pattern on a substrate includes separating the pattern into at least a first sub-pattern containing lines oriented in a first direction and a second sub-pattern containing lines oriented in a second direction. Lines oriented in the first direction are created on a first layer of photosensitive material on the substrate using a first standing wave interference pattern. A portion of the ...

Metal photoetching product and production method thereof

Patent Number: 8110344
Publication Date: 2012-02-07
Inventors: Akao, Shingo; Ueda, Ryuji; Tanaka, Satoshi; Koga, Osamu; Takagi, Fusao; Onoda, Yusuke; Matsuzawa, Hiroshi

A metal photoetching product comprising at least one large cavity of minor axis W₁S, major axis W₁L and depth D1 in a surface of the product, wherein one or more cavities are included inside at least one of the at least one large cavity, and a smallest hole among the cavities has minor axis of W₂S, major axis W₂L, and depth D2; and the product satisfies the following dimensions, D1+D2=plate thickness D, 0.02 mm≦D≦2 ...

Manufacturing method for optical recording and reproducing medium stamper

Patent Number: 8110343
Publication Date: 2012-02-07
Inventors: Endoh, Sohmei; Nakano, Jun; Suzuki, Tadao; Shimizu, Jun

In an optical recording and reproducing medium having a groove 2 formed along a recording track and which is recorded and/or reproduced with irradiation of light L having a predetermined wavelength λ, a track pitch p of the groove 2 is selected in a range of from 200 nm to 350 nm and a ratio w_g′/p between a width w_gof the groove 2 and the track pitch p is selected in a range of from 0.24 to ...

Method for forming an opening

Patent Number: 8110342
Publication Date: 2012-02-07
Inventors: Ma, Hong; Bai, Shi-Jie; Liu, Feng; Ng, Chun-Peng; Wang, Ye

A method for forming an opening is disclosed. First, a semiconductor substrate is provided, in which the semiconductor substrate includes at least one metal interconnects therein. A stacked film is formed on the semiconductor substrate, in which the stacked film includes at least one dielectric layer and one hard mask. The hard mask is used to form an opening in the stacked film without exposing the metal interconnects, and the hard mask is removed thereafter. A barrier layer is later ...

Method for manufacturing a semiconductor device by using first and second exposure masks

Patent Number: 8110341
Publication Date: 2012-02-07
Inventor: Choi, Jae Seung

A method is disclosed for manufacturing a semiconductor device. The method includes: forming a substrate including a cell region and an outside region, wherein the outside region is adjacent to the cell region; forming a line-shaped pattern over the substrate using a first exposure mask so that the line-shaped spacer pattern extends from the cell region to the outside region; and patterning the line-shaped pattern in the cell region into a bar pattern while removing the line-shaped pattern ...

Method of forming a pattern of a semiconductor device

Patent Number: 8110340
Publication Date: 2012-02-07
Inventor: Jung, Woo Yung

A pattern for a gate line is formed using a first photoresist pattern and a first BARC layer. A pad and patterns for a select line, which has a width that is larger than that of the gate line, are formed using a second photoresist pattern and a second BARC layer. The gate line, the pad and the select line can be formed at a same ...

Multi-tone resist compositions

Patent Number: 8110339
Publication Date: 2012-02-07
Inventor: Fedynyshyn, Theodore H.

Multi-tone resists can enhance the resolution limit of a lithographic process by advantageously using the changeable solubility of a resist composition as a function of lithographic radiation dosage. By imaging a multi-tone resist with different doses of lithographic radiation in a selected pattern, the pattern can be imparted to the resist upon subsequent development of the resist. In some aspects, a resist composition is utilized having an aliphatic polymer (e.g., a copolymer with ...

Heat-sensitive positive-working lithographic printing plate precursor

Patent Number: 8110338
Publication Date: 2012-02-07
Inventors: Lingier, Stefaan; Venneman, Jan; Loccufier, Johan; Van Aert, Hubertus; Van Damme, Marc

A heat-sensitive positive-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating including an IR absorbing agent, a phenolic resin, and a first polymer, wherein the first polymer is an alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II, wherein at least one of the aromatic groups Ar¹and Ar²is an ...

Polymerizable composition and lithographic printing plate precursor

Patent Number: 8110337
Publication Date: 2012-02-07
Inventor: Shimada, Kazuto

A polymerizable composition containing: (A) a binder polymer; (B) a compound having a polymerizable unsaturated group; and (C) a compound which has a triarylsulfonium salt structure and in which a sum of Hammett's a constants of all substituents bonded to the aryl skeleton is larger than ...

Resin and chemically amplified resist composition comprising the same

Patent Number: 8110336
Publication Date: 2012-02-07
Inventors: Takemoto, Ichiki; Ando, Nobuo

A resin comprising a structural unit represented by the formula (I):

wherein Q¹and Q²represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH₂— may be replaced by —O— etc., X¹represents —O—CO— etc., and A⁺ represents an organic counter ...

Resist patterning process and manufacturing photo mask

Patent Number: 8110335
Publication Date: 2012-02-07
Inventors: Watanabe, Tamotsu; Tanaka, Akinobu; Takeda, Takanobu; Watanabe, Satoshi; Masunaga, Keiichi; Koitabashi, Ryuji

There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid labile group, and an indene unit, and/or an acenaphthalene unit, wherein the polymer has the weight-average molecular weight of 4,000 to 7,000, and in particular, 4,500 to 5,500. One of the ...

Radiation-sensitive composition

Patent Number: 8110334
Publication Date: 2012-02-07
Inventors: Echigo, Masatoshi; Oguro, Dai

A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially ...

Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound

Patent Number: 8110333
Publication Date: 2012-02-07
Inventors: Kawanishi, Yasutomo; Wada, Kenji; Tsuchimura, Tomotaka; Kamimura, Sou

A resist composition includes (A) a compound represented by the following formula (I):

wherein each of R¹to R¹³independently represents a hydrogen atom or a substituent, provided that at least one of R¹to R¹³is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X⁻ represents an anion containing a proton acceptor functional ...

Electrophotographic toner and method for producing the electrophotographic toner

Patent Number: 8110332
Publication Date: 2012-02-07
Inventors: Suzuki, Kazumi; Norikane, Yoshihiro; Watanabe, Yohichiroh; Honda, Takahiro; Ohtani, Shinji; Sugimoto, Tsuyoshi

Provided are an electrophotographic toner and a method for producing the electrophotographic toner that satisfy high image quality, cleaning stability, and high productivity.

The electrophotographic toner is produced by spray-drying a toner ingredient-containing liquid, wherein the toner ingredient-containing liquid dissolves or disperses at least a resin, a low molecular mass organic material, and a colorant in an organic solvent, the resin is soluble in the organic solvent, the low ...

Electrophotographic developer and image forming method

Patent Number: 8110331
Publication Date: 2012-02-07
Inventor: Shimmura, Shoko

An electrophotographic developer including: magnetic particles, and a toner containing toner particles charged with the magnetic particles and having a particle diameter distribution, wherein the toner exhibits cumulative toner weight distributions of both square of charge amount q²[C²] and attachment force F [N] per particle with respect to a representative toner particle diameter in the particle diameter distribution, giving a linear approximation of plots of the ...

Toner, developer, toner container, process cartridge, image forming method, and image forming apparatus

Patent Number: 8110330
Publication Date: 2012-02-07
Inventors: Matsumoto, Mitsuyo; Kurose, Katsunori; Kadota, Takuya; Inoue, Masahide; Ishikawa, Yoshimichi; Nozaki, Tsuyoshi; Nozaki, Chiyoshi; Yamamoto, Atsushi

To provide a toner that contains at least a binder resin, a colorant, a releasing agent and zeolite, the toner being manufactured through O/W type wet granulation and having an average circularity of 0.970 or greater, and a developer and image forming method using the ...

Charge controlling agent and toner

Patent Number: 8110329
Publication Date: 2012-02-07
Inventors: Yano, Tetsuya; Kusakari, Ako; Kenmoku, Takashi; Minami, Masato; Fukui, Tatsuki; Fujimoto, Norikazu; Tominaga, Akiko; Ikeda, Takeshi; Tani, Atsushi

A charge controlling agent is provided as a compound in which an amide group is introduced together with a sulfonic group or a derivative thereof. The charge controlling agent is characterized by including at least one compound represented by the chemical formula (2) in which an amide group is introduced together with at least one of a sulfonic group, a sulfonic acid ester, a sulfonic acid salt, and a sulfonic acid ...

Electrophotographic photoreceptor, process cartridge and image forming apparatus

Patent Number: 8110328
Publication Date: 2012-02-07
Inventors: Nukada, Katsumi; Yamada, Wataru

An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer provided on or above the conductive support, the photosensitive layer having an outermost layer comprising a cured product of a composition comprising a curable resin, a surfactant containing a fluorine atom, and a charge transporting organic compound having a specific ...

Fluorinated nano diamond anticurl backside coating (ACBC) photoconductors

Patent Number: 8110327
Publication Date: 2012-02-07
Inventors: Ma, Lin; Grabowski, Edward F.; Zhang, Lanhui; Wu, Jin

A photoconductor that includes a first layer, a supporting substrate thereover, a photogenerating layer, and at least one charge transport layer of at least one charge transport component, and wherein the first layer is in contact with the supporting substrate on the reverse side thereof, and which first layer includes a fluorinated nano diamond ...

Electrophotographic photoreceptor, image forming apparatus, and process cartridge

Patent Number: 8110326
Publication Date: 2012-02-07
Inventor: Shimada, Tomoyuki

An electrophotographic photoreceptor including a conductive substrate and a photosensitive layer located overlying the conductive substrate which includes a naphthalenetetracarboxylic acid diimide derivative having a specific formula; and an image forming apparatus and a process cartridge using the electrophotographic photoreceptor are ...

Substrate treatment method

Patent Number: 8110325
Publication Date: 2012-02-07
Inventors: Kyouda, Hideharu; Niwa, Takafumi; Nakamura, Hiroshi

A substrate treatment method including a first treatment process (S13 to S16) for exposing, heating, and developing a substrate on which a first resist is formed, thereby forming a first resist pattern, and a second treatment process (S17 to S20) for forming a second resist film on the substrate on which the first resist pattern is formed, exposing, heating, and developing the substrate on which the second resist film is formed, thereby forming a second resist ...

Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor

Patent Number: 8110324
Publication Date: 2012-02-07
Inventors: Fujimori, Toru; Einaga, Hiroyuki; Maruyama, Yoichi; Tsuchimura, Tomotaka; Kaneko, Yushi; Shimada, Kazuto

A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of ...

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Patent Number: 8110323
Publication Date: 2012-02-07
Inventors: Nozawa, Osamu; Shiota, Yuki

The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the optically semitransmissive film. The film is formed on a translucent substrate and transmits a portion of light having a desired wavelength λ, wherein the film has ...

Method of mask forming and method of three-dimensional microfabrication

Patent Number: 8110322
Publication Date: 2012-02-07
Inventors: Kaneko, Tadaaki; Sano, Naokatsu

The invention provides a method for forming a selective mask on a surface of a layer of Al_XGa_YIn_1-X-YAs_ZP_1-Zor Al_XGa_YIn_1-X-YN_ZAs_1-Z(0≦X≦1, 0≦Y≦1, 0≦Z≦1), which is a method for forming a mask with a minute width suitable for microfabrication in nano-order.

(1) An energy beam 4a, 4b is selectively irradiated onto a natural oxide layer ...

Method of manufacture of damascene reticle

Patent Number: 8110321
Publication Date: 2012-02-07
Inventors: Hibbs, Michael S.; Petrarca, Kevin S.; Krishnan, Mahadevaiyer; Canaperi, Donald F.; Mih, Rebecca D.; Steen, Steven; Grabarz, Henry

A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing actinic radiation. Sacrificial materials may be added to the recess temporarily prior to filling the recess to provide gaps ...

Contrast-based resolution enhancement for photolithographic processing

Patent Number: 8108806
Publication Date: 2012-01-31
Inventors: Robles, Juan Andres Torres; Granik, Yuri

A contrast-based resolution enhancing technology (RET) determines a distribution of contrast values for edge fragments in a design layout or portion thereof. Resolution enhancement is applied to the edge fragments in a way that increases the number of edge fragments having a contrast value that exceeds a predetermined ...

Short path customized mask correction

Patent Number: 8108804
Publication Date: 2012-01-31
Inventors: Graur, Ioana; Mansfield, Scott M.

Embodiments of the present invention provide a method of performing photo-mask correction. The method includes identifying a hot-spot in a photo-mask that violates one or more predefined rules; creating a window area in the photo-mask that surrounds the hot spot; categorizing the window area; selecting a solution, from a library of pre-computed solutions, based on a category of the window area; and applying the solution to the hot spot. A service-oriented architecture (SOA) system that ...

Method of manufacturing a semiconductor device

Patent Number: 8105765
Publication Date: 2012-01-31
Inventor: Sekine, Yasuhiro

A method of manufacturing a semiconductor device by performing divisional exposure on a predetermined area on a wafer, through two or more reticles, on each of which a mask pattern region is formed. The method includes arranging the reticles such that an outer most periphery of a field circle of exposure light incident on the wafer aligns with at least one side of the mask pattern region formed in the reticle, and exposing, to exposure light, the wafer, through the reticles so ...

Patterning process

Patent Number: 8105764
Publication Date: 2012-01-31
Inventors: Ishihara, Toshinobu; Yoshihara, Takao; Hatakeyama, Jun

A pattern is formed through positive/negative reversal by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin, a photoacid generator, and an organic solvent onto a substrate, prebaking the resist composition, exposing the resist film to high-energy radiation, post-exposure heating, and developing the exposed resist film with an alkaline developer to form a positive pattern; irradiating or heating the positive pattern to facilitate ...

Method of forming plated product using negative photoresist composition and photosensitive composition used therein

Patent Number: 8105763
Publication Date: 2012-01-31
Inventors: Washio, Yasushi; Saito, Koji; Masuda, Yasuo

A method is provided that enables the formation of multiple level plated products with large plating depth. A negative photoresist composition comprising (a) an alkali-soluble resin, (b) an acid generator, and (c) other components is used, and a plated product is formed by (A) a step of forming a layer of this negative photoresist composition, and then either heating or not heating, before conducting exposure; (B) a step of repeating the step (A) so that the step is performed a total of 2 ...

Method for forming pattern using printing process

Patent Number: 8105762
Publication Date: 2012-01-31
Inventor: Ham, Yong-Sung

A pattern and method for forming a pattern includes providing a substrate on which a plurality of unit panels and etching object layers on the respective unit panel areas are formed, dividing the substrate into at least two or more areas, providing a cliché on which multiple grooves are formed, filling resist in the grooves, applying the resist filled in the groove of the cliché onto the etching object layer of the substrate by the divided area ...

Ink jet recording head manufacturing method

Patent Number: 8105761
Publication Date: 2012-01-31
Inventors: Horiuchi, Isamu; Hino, Etsuko; Ikeda, Masumi

A method of manufacturing a liquid discharge head including a flow path forming member configured to form a flow path communicating with a discharge port to discharge liquid, includes, providing a first layer which includes a photosensitive resin and a light absorption agent on a substrate, and providing a second layer which includes a positive photosensitive resin but substantially does not include the light absorption agent on the substrate, so as to coat the first layer, forming a ...

Patterning process and pattern surface coating composition

Patent Number: 8105760
Publication Date: 2012-01-31
Inventors: Watanabe, Takeru; Kobayashi, Katsuhiro; Hatakeyama, Jun; Katayama, Kazuhiro

A pattern is formed by applying a first positive resist composition comprising a polymer comprising recurring units which become alkali soluble under the action of acid onto a substrate to form a first resist coating, heat treating, exposing, heat treating, developing to form a first resist pattern, applying a pattern surface coating composition comprising a hydroxyl-containing crosslinkable polymer onto the first resist pattern and crosslinking, thereby covering the first resist pattern ...

Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition

Patent Number: 8105759
Publication Date: 2012-01-31
Inventors: Kumaki, Takashi; Miyasaka, Masahiro

A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with a polymerizable ethylenic unsaturated bond, (C) a photoradical polymerization initiator containing a 2,4,5-triarylimidazole dimer or its derivative, and (D) a compound represented by the following general formula (1)

(wherein R¹and R²each independently represent C1-20 alkyl, etc., and R³, R⁴, ...

Microphotonic maskless lithography

Patent Number: 8105758
Publication Date: 2012-01-31
Inventors: Popovic, Milos; Barwicz, Tymon

A maskless lithography system and method to expose a pattern on a wafer by propagating a photon beam through a waveguide on a substrate in a plane parallel to a top surface of the ...

Method of making a semiconductor device

Patent Number: 8105757
Publication Date: 2012-01-31
Inventor: Choi, Jae Seung

Disclosed is a method of making a semiconductor device in which a main pattern is formed through a photolithography process over a low-density pattern area having a relatively small number of patterns to be formed in certain areas as compared to the other areas. According to the method at least one or more dummy patterns are formed over inactive areas, adjacent to active areas, where the main pattern is formed, and are spaced a predetermined distance from the sides of the main pattern. This ...

Method for preparing a printing form using vibrational energy

Patent Number: 8105756
Publication Date: 2012-01-31
Inventors: Arnold, Carl Bernard; Harding, Thomas William

A method and apparatus for preparing a relief printing form from a photosensitive element that includes a photopolymerizable composition layer having an exterior surface and capable of being partially liquefied. The method includes the steps of (a) heating the exterior surface of the photopolymerizable composition layer to a temperature sufficient to cause a portion of the layer to liquefy, forming the liquefied material; and (b) removing the liquefied material; wherein the heating step is ...

Method for processing of photopolymer printing plates with overcoat

Patent Number: 8105755
Publication Date: 2012-01-31
Inventors: Fiebag, Ulrich; Baumann, Harald; Strehmel, Bernd; Simpson, Christopher D.

Method is described for producing an imaged lithographic printing plate from a precursor comprising a free-radical polymerizable coating and an oxygen-impermeable overcoat, characterized in that removing the overcoat, developing and gumming is carried out in one single ...

Functionalized fullerenes for nanolithography applications

Patent Number: 8105754
Publication Date: 2012-01-31
Inventors: Koopman, Benjamin L.; Krishna, Vijay; Moudgil, Brij M.; Singh, Amit Kumar

A method for electron beam nanolithography without the need for development step involves depositing a film of a resist comprising functionalized fullerenes on a substrate, and writing features by exposure to an electron beam with an accelerating voltage and dose rate sufficient to promote heating or thermal degradation of the functionalized fullerene in the irradiated volume such that a pattern is generated without a subsequent development step or with an aqueous developer. Lithographic ...

System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules

Patent Number: 8105753
Publication Date: 2012-01-31
Inventors: Kercher, Dan Saylor; Tzeng, Huey-Ming; Dai, Qing

A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and ...

Photosensitive polyimides

Patent Number: 8105752
Publication Date: 2012-01-31
Inventors: Lee, Chuan Zong; Chou, Meng-Yen

The invention pertains to an epoxy-modified photosensitive polyimide, which possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used in a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed circuit ...

Planographic printing plate precursor and pile of planographic printing plate precursors

Patent Number: 8105751
Publication Date: 2012-01-31
Inventor: Endo, Akihiro

The invention has a support, a recording layer provided on the support, and a protective layer containing a hydrophilic polymer and silica-coated organic resin fine particles provided as the uppermost layer. The organic resin fine particles are preferably composed of at least one resin selected from the group consisting of polyacrylic acid resins, polyurethane resins, polystyrene resins, polyester resins, epoxy resins, phenolic resins, and melamine resins, and the protective layer ...

Optical recording medium and method of manufacturing the same

Patent Number: 8105750
Publication Date: 2012-01-31
Inventors: Yano, Toru; Wada, Yutaka; Shigeno, Koichi; Suwabe, Masatsugu

Recording and reproducing characteristics and data saving reliability are secured in a write-once two-layer recording medium.

A second recording layer from a side irradiated with light for recording and reproduction includes organic dye shown by a general formula of a chemical formula 3 described below (in the formula, R1 and R2 are alkyl groups of carbon number 1 to 4; Y1, Y2 respectively are organic groups independently; and X is Cl0₄, BF₄, PF₆, ...

Polymer compound, positive resist composition, and method of forming resist pattern

Patent Number: 8105749
Publication Date: 2012-01-31
Inventors: Ohshita, Kyoko; Dazai, Takahiro; Mori, Takayoshi; Shimizu, Hiroaki

There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, ...

Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process

Patent Number: 8105748
Publication Date: 2012-01-31
Inventors: Tachibana, Seiichiro; Ohashi, Masaki; Hatakeyama, Jun; Kinsho, Takeshi; Ohsawa, Youichi

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R¹is H, F, methyl or trifluoromethyl, R², R³and R⁴are C₁-C₁₀alkyl, alkenyl or oxoalkyl or C₆-C₁₈aryl, aralkyl or aryloxoalkyl, or two of R², R³and R⁴may bond together to form a ring with S, A is a C₂-C₂₀hydrocarbon group having cyclic structure, and n is 0 ...

Positive resist composition and method of forming resist pattern

Patent Number: 8105747
Publication Date: 2012-01-31
Inventors: Ohshita, Kyoko; Yoshii, Yasuhiro; Utsumi, Yoshiyuki; Shimizu, Hiroaki

A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a ...

Tertiary alcohol derivative, polymer compound and photoresist composition

Patent Number: 8105746
Publication Date: 2012-01-31
Inventors: Aratani, Ichihiro; Fukumoto, Takashi

(1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided.

(In ...

Radiation crosslinker

Patent Number: 8105745
Publication Date: 2012-01-31
Inventors: Chua, Lay-Lay; Ho, Peter Kian-Hoon; Sivaramakrishnan, Sankaran; Chia, Perq-Jon; Khong, Siong-Hee

There is provided a class of crosslinking compound, said compound comprising (i) one or more fluorinated aromatic group; and (ii) one or more ionizable group, wherein the crosslinking compound is soluble in at least one polar solvent. Methods of preparing the crosslinking compounds are also disclosed. There is further provided devices obtainable from the methods of preparing the crosslinking ...

Image forming method and image forming apparatus

Patent Number: 8105744
Publication Date: 2012-01-31
Inventor: Matsumura, Yasuo

An image forming method includes forming an electrostatic latent image on a surface of a latent image carrier; developing the electrostatic latent image with a developing agent including a toner to form a toner image; transferring the toner image onto a surface of a target to obtain a transferred toner image; and fixing the transferred toner image; wherein the toner includes a resin particle having a core-shell structure, both of a resin constituting the core and a resin constituting the ...