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		    <title>PatentStorm -&gt; Patents -&gt; Coating apparatus</title>
		    <link>http://www.patentstorm.us/rss/class/patents/rss-118.xml</link>
		    <description>Recent patents filings in USPTO Class 118 Coating apparatus.</description>
		    <pubDate>Tue, 21 May 2013 16:09:29</pubDate>
		    <managingEditor>patents@patentstorm.us</managingEditor>
		    <language>en</language><atom10:link xmlns:atom10="http://www.w3.org/2005/Atom" rel="self" type="application/rss+xml" href="http://feeds.feedburner.com/Patentstorm-Patents-CoatingApparatus" /><feedburner:info uri="patentstorm-patents-coatingapparatus" /><atom10:link xmlns:atom10="http://www.w3.org/2005/Atom" rel="hub" href="http://pubsubhubbub.appspot.com/" /><item>
			         <title><![CDATA[Coating device]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/YWW1hUeB9HM/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8444767&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A coating device includes a reaction device, a mixing device, a deposition device, a first switching device and a second switching device. The reaction device defines a reaction chamber. The mixing device is connected to the reaction device and defines a mixing chamber that communicates with the reaction chamber. The deposition device is connected to the mixing device and defines a deposition chamber that communicates with the mixing chamber. The first switching device is configured to ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/YWW1hUeB9HM" height="1" width="1"/&gt;</description>
			         
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<item>
			         <title><![CDATA[System and method for recycling a gas used to deposit a semiconductor layer]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/KsV6XJIqW4s/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8444766&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A system for recycling includes a processing chamber, a reclamation reservoir and a mixing reservoir. The processing chamber is configured to receive a deposition gas deposited onto a semiconductor layer. The processing chamber has an exhaust to discharge an unused portion of the deposition gas as an effluent gas. The reclamation reservoir is in fluid communication with the processing chamber. The reclamation reservoir is configured to receive and store the effluent gas from the processing ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/KsV6XJIqW4s" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8444766/description.html</feedburner:origLink></item>
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			         <title><![CDATA[Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/QSD5vRdIxec/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8443756&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/QSD5vRdIxec" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8443756/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Paint applicator with vacuum regulator]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/03L6MMl93jg/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8443755&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A paint spraying system having a paint reservoir (&lt;b&gt;16&lt;/b&gt;) remote from a spray gun (&lt;b&gt;12&lt;/b&gt;) of the type which draws paint to the gun using vacuum (&lt;b&gt;6, 7&lt;/b&gt;). A paint pump (&lt;b&gt;14&lt;/b&gt;) delivers paint under positive pressure to the paint gun and a paint regulator (&lt;b&gt;28&lt;/b&gt;) in or associated with the paint gun delivers the paint to the gun as drawn by vacuum by the gun through the regulator. An over-pressure relief valve (&lt;b&gt;70&lt;/b&gt;) may be used to limit the positive pressure delivered ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/03L6MMl93jg" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8443755/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Electrostatic coating apparatus]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/5EZwIE07tak/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8443754&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;An atomizer (&lt;b&gt;2&lt;/b&gt;) with a rotary atomizing head (&lt;b&gt;4&lt;/b&gt;) is mounted on the front side of a housing member (&lt;b&gt;6&lt;/b&gt;) in which an air motor (&lt;b&gt;3&lt;/b&gt;) is accommodated. A primary external electrode (&lt;b&gt;8&lt;/b&gt;) is located around the outer peripheral side of the housing member (&lt;b&gt;6&lt;/b&gt;) in such a way as to encircle the housing member (&lt;b&gt;6&lt;/b&gt;). A secondary external electrode (&lt;b&gt;10&lt;/b&gt;) is located on the front side of the housing member (&lt;b&gt;6&lt;/b&gt;), in a position closer to the rotary ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/5EZwIE07tak" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8443754/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Film forming apparatus and method for forming film]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/Y3Y8KNGN7Xk/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8443753&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A film forming apparatus includes a processing chamber defined by walls, an application preparation room in which an applicator is temporary provided, a first carrier transporting the applicator from the application preparation room to the processing chamber, a stage on which a substrate is disposed and a maintenance part disposed adjacent to the application preparation room. A liquid is applied from the applicator onto the substrate to form a film on the ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/Y3Y8KNGN7Xk" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8443753/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Method and device for arranging a sprinkling material on a dough piece]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/u012byNPZbc/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8443752&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-21&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The present invention relates to a method and device for arranging sprinkling material, such as seed, on a dough piece, including at least one member for arranging the sprinkling material on a surface for dough pieces and at least one member for placing the dough piece on the surface provided with the sprinkling material, and also further including in an advantageous embodiment at least one member for applying an adhesive such as water to at least a part of the dough piece to be provided ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/u012byNPZbc" height="1" width="1"/&gt;</description>
			         
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			         <title><![CDATA[Apparatus and method for deposition for organic thin films]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/cy-_bjD4mpI/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8440021&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The invention provides apparatus and methods for organic continuum vapor deposition of organic materials on large area ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/cy-_bjD4mpI" height="1" width="1"/&gt;</description>
			         
			         <guid isPermaLink="false">8440021</guid>
			
			      <feedburner:origLink>http://www.patentstorm.us/patents/8440021/description.html</feedburner:origLink></item>
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			         <title><![CDATA[Apparatus and method for the production of flexible semiconductor devices]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/r_av7SziEMM/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8440020&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Apparatus for continuously producing flexible semiconductor devices through deposition of a plurality of semiconductor layers onto a moving flexible substrate by using Plasma Enhanced Chemical Vapor Deposition (PECVD) processing, where at least two successive layers are deposited in the same deposition chamber onto the substrate traveling in opposite directions. Computer program product directly loadable into the internal memory of a digital computer comprising software code portions for ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/r_av7SziEMM" height="1" width="1"/&gt;</description>
			         
			         <guid isPermaLink="false">8440020</guid>
			
			      <feedburner:origLink>http://www.patentstorm.us/patents/8440020/description.html</feedburner:origLink></item>
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			         <title><![CDATA[Lower liner with integrated flow equalizer and improved conductance]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/at4FY6mp0vk/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8440019&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/at4FY6mp0vk" height="1" width="1"/&gt;</description>
			         
			         <guid isPermaLink="false">8440019</guid>
			
			      <feedburner:origLink>http://www.patentstorm.us/patents/8440019/description.html</feedburner:origLink></item>
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			         <title><![CDATA[Apparatus for supplying source and apparatus for deposition thin film having the same]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/F1AMKv1cqLo/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8440018&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The present invention provides an apparatus for supplying a source and an apparatus for depositing a thin film having the same. The apparatus for supplying a source includes a horizontal channel extending in one direction; pumping and transfer ports extending to pass through the horizontal channel, the pumping and transfer ports being spaced apart from each other; a transfer shaft inserted into the horizontal channel to reciprocate therein; and a storage room connected to one side of the ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/F1AMKv1cqLo" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8440018/description.html</feedburner:origLink></item>
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			         <title><![CDATA[Multi-electrode PECVD source]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/SZTOn_9OmDY/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8438990&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Embodiments of the present invention generally relate to methods and apparatus for plasma generation in plasma processes. The methods and apparatus generally include a plurality of electrodes. The electrodes are connected to a RF power source, which powers the electrodes out of phase from one another. Adjacent electrodes are electrically isolated from one another by electrically insulating members disposed between and coupled to the electrodes. Processing gas may be delivered and/or ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/SZTOn_9OmDY" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8438990/description.html</feedburner:origLink></item>
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			         <title><![CDATA[Surface feed-in electrodes for deposition of thin film solar cell and signal feed-in method thereof]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/ykG1yIb6IWQ/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8438989&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The present invention discloses a surface feed-in electrode structure for thin film solar cell deposition, relating to solar cell technologies. The surface feed-in electrode structure uses a signal feed-in component with a flat waist and a semicircular feed-in end to connect the signal feed-in port by surface contact. The signal feed-in port is located in a hallowed circular area of a center of the backside of a cathode plate, and feeds in an RF/VHF power supply signal. An anode plate is ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/ykG1yIb6IWQ" height="1" width="1"/&gt;</description>
			         
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			         <title><![CDATA[Powdering device for powdering printed sheet]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/kvjjC6pfds0/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8438988&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-14&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A powdering device includes: a powder placing member having a placing section on which a powder fed from a storage container is placed; a first scraping member for scraping the powder on the placing section of the powder placing member, so that a constant amount of the powder remains on the placing section; and a second scraping member for scraping off the resultant constant-amount powder remaining on the placing section, and the powdering device transfers the scraped powder with an air ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/kvjjC6pfds0" height="1" width="1"/&gt;</description>
			         
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			         <title><![CDATA[Thin film forming apparatus and method]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/eqHORs6bq3c/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8435353&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;According to one embodiment, the thin film forming apparatus includes a boat capable of holding two wafers, in each of which a cutout portion is provided in an outer peripheral edge portion, in a groove portion for holding a wafer in a state where back surfaces face each other. Moreover, the thin film forming apparatus includes a reactor that accommodates the boat and form a coating on each of surfaces of the two wafers by a vapor deposition reaction. The positions in the groove portion, at ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/eqHORs6bq3c" height="1" width="1"/&gt;</description>
			         
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			         <title><![CDATA[Apparatus and method for coating a substrate]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/46_n_5d3IbY/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8435352&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;An apparatus for coating a substrate using physical vapor deposition, including a vacuum chamber wherein a coil is placed for keeping an amount of conductive material in levitation and for heating and evaporating that material, using a varying electric current in the coil. Isolating member are placed in the coil to isolate the coil from the levitated material. The isolating member is part of a container made of non-conductive material. The container has one or more openings for guiding ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/46_n_5d3IbY" height="1" width="1"/&gt;</description>
			         
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			         <title><![CDATA[Method and system for measuring a flow rate in a solid precursor delivery system]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/fA-RyvEWWAM/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8435351&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Improved measurement accuracy for determining the flow rate of precursor vapor to the deposition tool, particularly for use with low vapor pressure precursors, such as ruthenium carbonyl (Ru&lt;sub&gt;3&lt;/sub&gt;(CO)&lt;sub&gt;12&lt;/sub&gt;) or rhenium carbonyl (Re&lt;sub&gt;2&lt;/sub&gt;(CO)&lt;sub&gt;10&lt;/sub&gt;). In one embodiment, the system includes a differential pressure manometer is provided for measuring the flow rate. A method of measurement and calibration is also ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/fA-RyvEWWAM" height="1" width="1"/&gt;</description>
			         
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			         <title><![CDATA[Supply device]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/G4v93BRDzRo/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8435350&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A device for supplying a large number of consumer stations with a predetermined amount of a process medium, in particular a coating device for containers, has a supply line for the process medium and a connection at the consumer station. In order to make such a device simpler from the structural point of view and less expensive, a unit is used, which keeps a predetermined flow rate constant and which comprises a capillary path extending before each connection and dimensioned in accordance ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/G4v93BRDzRo" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8435350/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Epitaxial reactor for mass production of wafers]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/SS7nEPhLuOk/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8435349&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A high throughput reactor for the mass production of wafers through chemical vapor deposition, mainly to form silicon epitaxies for the photovoltaic industry, is described. Main innovation is a high susceptor stacking density: several graphite susceptors are placed vertically and parallel to one another, electrically interconnected, and are heated by Joule effect. Electrical current gets to the susceptors from the current source through specially designed feedthroughs, which connect the ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/SS7nEPhLuOk" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8435349/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Paint booth with purifier]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/GVinrmmiMj0/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8435348&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A paint booth is provided with a purifier. The purifier includes a water tank, pump, water cord formation mechanism, sludge removal mechanism, exhaust mechanism, and barrier member. The water cord formation mechanism includes a water case located in an upper part of a spray chamber. A large number of nozzles are formed in a bottom wall of the water case. Each nozzle includes a tubular portion, the inside diameter of which is reduced downward from an inlet, and a circular outlet. Water ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/GVinrmmiMj0" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8435348/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Substrate carrying apparatus having circumferential sidewall and substrate processing system]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/rnHu1ZdSvHU/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8434423&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Disclosed is a substrate carrying apparatus having a simple configuration capable of inhibiting the occurrence of pattern collapse. A carrying tray of the disclosed substrate carrying apparatus includes a bottom plate for supporting the substrate and a circumferential side wall being provided around the bottom plate. An opening is formed in the bottom plate. An elevating member, to and from which the substrate is to be transferred, passes through the opening. A space is temporarily formed ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/rnHu1ZdSvHU" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8434423/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Coating apparatus and method]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/6y1GKZg3wlI/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8434422&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-05-07&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The present invention generally relates to a coating apparatus and method for substantially simultaneously forming a plurality of coatings on a substrate and to a method of analyzing at least one characteristic or property of the ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/6y1GKZg3wlI" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8434422/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Hydrophobicizing apparatus, hydrophobicizing method and storage medium]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/paia0SnQmfs/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430967&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The hydrophobicizing apparatus includes a vaporizing surface forming member of which surface is located in a vaporizing room; a vaporizing surface heating unit that heats the vaporizing surface forming member; a liquid chemical supply port that supplies a liquid chemical for a hydrophobicizing process on the surface of the vaporizing surface forming member; a gas inlet port that introduces a carrier gas into the vaporizing room; an outlet port that supplies a hydrophobicizing gas vaporized ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/paia0SnQmfs" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430967/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/qxeA7yWgoLI/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430966&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material. A heated distribution manifold is disposed below the receptacle and includes a plurality of passages defined therethrough. The receptacle is indirectly heated by the distribution manifold to a degree sufficient to sublimate source ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/qxeA7yWgoLI" height="1" width="1"/&gt;</description>
			         
			         <guid isPermaLink="false">8430966</guid>
			
			      <feedburner:origLink>http://www.patentstorm.us/patents/8430966/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Epitaxial growth system for fast heating and cooling]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/AfYf8OoxHxI/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430965&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A system for crystal growth having rapid heating and cooling. A fluid-cooling jacket having a reflective shield contained therein is disposed around a heating cylinder in which crystal growth takes place. A heating coil is disposed round the cooling jacket. The invention also includes a method of crystal growth and semiconductor devices formed using the inventive methods and ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/AfYf8OoxHxI" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430965/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Coating apparatus]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/1kB5hSGEKrU/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430964&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A coating apparatus includes a chamber device and a transporting device. The chamber device defines two separated coating chambers, two coating channels, which are alternately arranged, two coating slots communicating the coating chambers with the coating channels respectively, and a transportation channel extending to intersect the coating chambers and the coating channels and communicate with the coating channels. The transporting device includes a carrying board for carrying a substrate ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/1kB5hSGEKrU" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430964/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Cool-down system and method for a vapor deposition system]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/25wUVAnuCGE/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430963&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A system for vapor deposition of a thin film layer on photovoltaic (PV) module substrates includes a system for cool-down of the vacuum chamber through which substrates are conveyed in a vapor deposition process. The cool-down system is configured with the vacuum chamber to recirculate a cooling gas through the vacuum chamber and through an external heat exchanger in a closed cool-down loop. An associated method for forced cool-down of the vacuum chamber is also ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/25wUVAnuCGE" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430963/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Gas supply device, substrate processing apparatus and substrate processing method]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/g7YwuQ7WdoQ/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430962&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A gas supply mechanism includes a gas introduction member having gas inlet portions through which a gas is introduced into a processing chamber, a processing gas supply unit, a processing gas supply path, branch paths, an additional gas supply unit and an additional gas supply path. The gas inlet portions includes inner gas inlet portions for supplying the gas toward a region where a target substrate is positioned in the chamber and an outer gas inlet portion for introducing the gas toward ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/g7YwuQ7WdoQ" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430962/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Source gas flow path control in PECVD system to control a by-product film deposition on inside chamber]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/gsfPjRK5Mn4/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430961&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; ; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;The present invention generally comprises a method and an apparatus for guiding the flow of processing gases away from chamber walls and slit valve opening. By controlling the flow path of the process gases within a processing chamber, undesirable deposition upon chamber walls and within slit valve openings may be reduced. By reducing deposition in slit valve openings, flaking may be reduced. By reducing deposition on chamber walls, the time between chamber cleaning may be increased. Thus, ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/gsfPjRK5Mn4" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430961/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Deposition systems and susceptor assemblies for depositing a film on a substrate]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/n-7tjXthVWc/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430960&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Parasitic deposits are controlled in a deposition system for depositing a film on a substrate, the deposition system of the type defining a reaction chamber for receiving the substrate and including a process gas in the reaction chamber and an interior surface contiguous with the reaction chamber. Such control is provided by flowing a buffer gas between the interior surface and at least a portion of the process gas to form a gas barrier layer such that the gas barrier layer inhibits contact ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/n-7tjXthVWc" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430960/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Precision pen height control for micro-scale direct writing technology]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/-n72vjZpSKg/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430059&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;An apparatus for precision pen height control which includes a dispensing member, a fluid dispensing system, a vertical position sensing system, and a vertical position controller. The fluid dispensing system is in fluid communication with an opening in the dispensing member via a tubular member. A vertical position sensing system, which includes a diffraction grating and a sensor, is engaged to the tubular member. The sensor is positioned adjacent the diffraction grating. The diffraction ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/-n72vjZpSKg" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430059/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Electrostatic coating apparatus with insulation enlarging portions]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/g3AbIW9j7ik/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430058&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Provided is an electrostatic coating apparatus capable of insulating an electric motor electrically from a member, to which an electrostatic high voltage is applied, and reducing the size and weight of the electrostatic coating apparatus. This electrostatic coating apparatus comprises a rotary atomizing head, to which high voltage is electrostatically applied, an electrostatically grounded AC servomotor, and a spindle and a fixed insulating member for insulating the AC servomotor ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/g3AbIW9j7ik" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430058/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Stent support devices]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/0RlrUKzdyAY/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430057&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A collet shaped to minimize the contact area of a stent end with a surface of the collet. The collet has an end surface for contacting a stent end that includes a raised or projecting portion and a flat or relatively flat portion. The projecting, portion has at least three segments radiating from a center to the edge of the ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/0RlrUKzdyAY" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430057/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Apparatus for making epitaxial film]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/iGAtbQ5_0SY/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430056&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventor:&lt;/strong&gt; &amp;nbsp;&lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;An apparatus for growing an epitaxial film and transferring it to an assembly substrate is disclosed. The film growth and transfer are made using an epitaxy lateral overgrowth technique. The formed epitaxial film on an assembly substrate can be further processed to form devices such as solar cell, light emitting diode, and other devices and assembled into higher integration of desired ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/iGAtbQ5_0SY" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430056/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Methods and apparatuses for coating balloon catheters]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/lGPVFzhhsCw/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430055&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;Embodiments of the invention relate to a method and apparatus for coating a medical device. In one embodiment, the method for preparing a substantially uniform coated medical device includes (1) preparing a coating solution comprising a solvent, a therapeutic agent, and an additive; (2) loading a metering dispenser with the coating solution; (3) rotating the medical device about the longitudinal axis of the device and/or moving the medical device along the longitudinal or transverse axis of ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/lGPVFzhhsCw" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430055/description.html</feedburner:origLink></item>
<item>
			         <title><![CDATA[Portable fingerprint development system]]></title>
			         <link>http://feedproxy.google.com/~r/Patentstorm-Patents-CoatingApparatus/~3/XIips35WGio/description.html</link>
			         <description>&lt;ul&gt;&lt;li&gt;&lt;strong&gt;Patent Number:&lt;/strong&gt; &amp;nbsp;8430054&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Publication Date:&lt;/strong&gt; &amp;nbsp;2013-04-30&lt;/li&gt;&lt;li&gt;&lt;strong&gt;Inventors:&lt;/strong&gt; &amp;nbsp;; ; &lt;/li&gt;&lt;/ul&gt;
&lt;p&gt;A portable fingerprint development system having a container and a base plate. The container includes a plurality of joined walls that present an opening and a rim surrounding the opening. The base plate has opposed first and second surfaces. The first surface mounts a heater that is operable to heat a fingerprint development material. The base plate is moveable between a transport position, in which the first surface is adjacent the container's rim and the heater is positioned within the ...&lt;br /&gt;&lt;img src="http://feeds.feedburner.com/~r/Patentstorm-Patents-CoatingApparatus/~4/XIips35WGio" height="1" width="1"/&gt;</description>
			         
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			      <feedburner:origLink>http://www.patentstorm.us/patents/8430054/description.html</feedburner:origLink></item>
</channel>
		</rss>
