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		    <title>PatentStorm -&gt; Patents -&gt; Cleaning and liquid contact with solids</title>
		    <link>http://www.patentstorm.us/rss/class/patents/rss-134.xml</link>
		    <description>Recent patents filings in USPTO Class 134 Cleaning and liquid contact with solids.</description>
		    <pubDate>Tue, 18 Jun 2013 16:10:49</pubDate>
		    <managingEditor>patents@patentstorm.us</managingEditor>
		    <language>en</language><atom10:link xmlns:atom10="http://www.w3.org/2005/Atom" rel="self" type="application/rss+xml" href="http://feeds.feedburner.com/Patentstorm-Patents-CleaningAndLiquidContactWithSolids" /><feedburner:info xmlns:feedburner="http://rssnamespace.org/feedburner/ext/1.0" uri="patentstorm-patents-cleaningandliquidcontactwithsolids" /><atom10:link xmlns:atom10="http://www.w3.org/2005/Atom" rel="hub" href="http://pubsubhubbub.appspot.com/" /><item>
			         <title><![CDATA[Modular recycling cleaning system]]></title>
			         <link>http://www.patentstorm.us/patents/8465597/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8465597</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A modular recycling cleaning system comprising in combination: a pressure washing and control module, a vacuum motor assembly module, a reservoir module, an air/liquid separator module, a flexible hose system, a control system and a cleaning head, capable of being easily configured so as to function as any one of: a straight through pressure washer with cleaning liquid supplied from an external source; a straight through pressure washer with cleaning liquid supplied internally from an ...<br /> 		
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			         <title><![CDATA[Supercritical processing apparatus and supercritical processing method]]></title>
			         <link>http://www.patentstorm.us/patents/8465596/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8465596</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>Disclosed is a supercritical processing apparatus and a supercritical processing method for suppressing the pattern collapse or the injection of material constituting a processing liquid into a substrate. A processing chamber receives a substrate subjected to a processing with supercritical fluid, and a liquid supply unit supplies a processing liquid including a fluorine compound to the processing chamber. A liquid discharge unit discharges the supercritical fluid from the processing ...<br /> 		
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			         <title><![CDATA[Apparatus and method for cleaning substrates/media disks]]></title>
			         <link>http://www.patentstorm.us/patents/8465595/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8465595</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>An apparatus and method for cleaning workpieces (<b>5</b>) using two pairs of substantially vertical rotating roller brushes (<b>15</b>) at each brush station whereby rotation of said brushes (<b>15</b>) propel workpieces (<b>5</b>) from one brush station to the next. Workpieces (<b>5</b>) are held for a predetermined period of time at each station by edgewheels (<b>30, 31</b>) which also rotate the workpieces (<b>5</b>). Cleaning fluid is sprayed onto workpieces (<b>5</b>) as they rotate ...<br /> 		
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			         <title><![CDATA[Battery jumper cables with integral wire brush]]></title>
			         <link>http://www.patentstorm.us/patents/8465594/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8465594</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Motor vehicle jumper cables comprising an integral wire brush mounted on an interior portion of the clamp assemblies is herein disclosed. The jumper cables with the wire brush are to be motioned to remove battery terminal corrosion, thereby providing for a better electrical connection. The device resembles a standard pair of jumper cables used to aid in jump-starting a motor vehicle with a dead battery and comprises a small wire brush located inside of each jaw area. The bristles are made ...<br /> 		
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			         <title><![CDATA[Reclaim chemistry]]></title>
			         <link>http://www.patentstorm.us/patents/8464736/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8464736</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Systems, apparatus and methods are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention provide a reclaim approach that prevents the evaporation of chemical solvents used to process wafers using proximity heads, by confining hot liquid solvents used to form fluid menisci on the wafer surface with cold liquid solvents of the same chemical ...<br /> 		
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			         <title><![CDATA[Sprayless surface cleaning wand]]></title>
			         <link>http://www.patentstorm.us/patents/8464735/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8464735</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>An elongated solution injection bar operable in a cleaning system as a combination dry vacuum and fluid carpet cleaner. The elongated solution injection bar having an upper solution distribution and pressure equalization chamber in fluid communication with a lower solution discharge chamber through a solution flow restrictor structured for distributing hot liquid cleaning solution in a substantially uniform flow along substantially the entire length of a cleaning head operating surface. The ...<br /> 		
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			         <title><![CDATA[Apparatus for wet processing substrate]]></title>
			         <link>http://www.patentstorm.us/patents/8464734/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8464734</li><li><strong>Publication Date:</strong> &nbsp;2013-06-18</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>An exemplary apparatus for wet processing a substantially rectangular substrate includes a conveyor, a supporting mechanism, an adjusting mechanism, a processing module and a dosing system. The conveyor is configured for conveying the substrate to a wet process work station. The supporting mechanism is configured for supporting the substrate away from the conveyor. The adjusting mechanism is configured for adjusting the orientation of the substrate. The processing module is configured for ...<br /> 		
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			         <title><![CDATA[Abrasive wire cleaning apparatus with stirring nozzles]]></title>
			         <link>http://www.patentstorm.us/patents/8460480/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460480</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A stirring nozzle used in an apparatus for abrasive wire cleaning. The stirring nozzles can be used in series to create multiple cleaning steps wherein fresh cleaning compound contacts the wire to be cleaned. The cleaning apparatus moves both the wire and an abrasive cleaning compound through the interior of the stirring nozzles. At the exit end of each stirring nozzle, cleaning compound is moved outward from the wire path. At the inlet end of each stirring nozzle, cleaning compound is ...<br /> 		
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			         <title><![CDATA[Door assembly for a dishwashing appliance, and associated apparatuses and methods]]></title>
			         <link>http://www.patentstorm.us/patents/8460479/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460479</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A door assembly and associated components for a dishwashing appliance are provided, wherein the dishwashing appliance includes a tub portion defining a forward access opening. The door assembly is pivotably engaged with the tub portion and cooperates therewith to cover the forward access opening. The door assembly includes an integrally formed and structurally reinforced inner door member, without a separate reinforcement panel. The inner door member includes at least one reinforcing member ...<br /> 		
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			         <title><![CDATA[Wet processing apparatuses]]></title>
			         <link>http://www.patentstorm.us/patents/8460478/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460478</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; ; </li></ul>
<p>A semiconductor apparatus includes a first tank configured to accommodate a first fluid. A second tank is configured to receive overflow of the first fluid into an upper portion of the second tank and to accommodate a second fluid. A cycling system including a first conduit is configured between the first tank and the second tank. The first conduit has an end substantially below a surface of the second fluid. A fluid providing system including a second conduit is fluidly coupled to the ...<br /> 		
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			         <title><![CDATA[Ethoxylated alcohol and monoethoxylated quaternary amines for enhanced food soil removal]]></title>
			         <link>http://www.patentstorm.us/patents/8460477/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460477</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A cleaning composition including an ethoxylated alcohol and monoethoxylated quaternary amine blend, a water conditioning agent, an acid source, a solvent, and water. In one embodiment, the cleaning composition is substantially free of alkyl phenol ethoxylates. The cleaning composition is capable of removing soils including up to 20% proteins. The cleaning compositions include a biodegradable, volatile organic compound free, environmentally friendly alternative to nonyl phenol ethoxylates ...<br /> 		
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			         <title><![CDATA[Apparatus for and method of processing substrate subjected to exposure process]]></title>
			         <link>http://www.patentstorm.us/patents/8460476/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460476</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A method of processing a substrate subjected to an exposure process includes the steps of: transporting a substrate subjected to the exposure process to a cleaning processing part and performing a cleaning process in said cleaning processing part on said substrate subjected to the exposure process. The method also includes the steps of transporting said substrate subjected to the cleaning process from said cleaning processing part to a heating processing part and performing a heating ...<br /> 		
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			         <title><![CDATA[Molded rotatable base for a porous pad]]></title>
			         <link>http://www.patentstorm.us/patents/8460475/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460475</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A rotatable base for a porous pad has openings that provide for improved flow distribution of a liquid in the base across a substrate. The rotatable base can be molded form a two piece mold and the openings can have draft angles to facilitate the molding ...<br /> 		
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			         <title><![CDATA[Method of cleaning semiconductor wafers]]></title>
			         <link>http://www.patentstorm.us/patents/8460474/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8460474</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A method of cleaning semiconductor wafers using an acid cleaner followed by an alkaline cleaner to clean contaminants from the materials is provided. The acid cleaner removes substantially all of the metal contaminants while the alkaline cleaner removes substantially all of the non-metal contaminants, such as organics and particulate ...<br /> 		
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			         <title><![CDATA[Support structure removal system]]></title>
			         <link>http://www.patentstorm.us/patents/8459280/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8459280</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A support structure removal system comprising a vessel and a second component. The vessel comprises a vessel body, a porous floor configured to retain a three-dimensional part, and an impeller rotatably mounted below the porous floor. The second component comprises a surface configured to operably receive the vessel, and a rotation-inducing assembly located below the surface, where the rotation-inducing assembly is configured to rotate the impeller with magnetic fields when the vessel is ...<br /> 		
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			         <title><![CDATA[Spray nozzle tip adapter and method of cleaning paint spray nozzle]]></title>
			         <link>http://www.patentstorm.us/patents/8459279/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8459279</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A spray nozzle tip adapter for cleaning a paint spray nozzle includes a rigid body member having an inlet port having annular sealing surfaces on one side, an exit port having annular sealing surfaces on another side and a passage connecting the inlet port and the exit port. The inlet port is shaped and sized to frictionally engage in a sealed relationship differently sized dispensing tubes of pressurized liquid solvent cans, and the exit port is shaped and sized to frictionally engage and ...<br /> 		
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			         <title><![CDATA[Dishwashing machine equipped with a sorption drying device]]></title>
			         <link>http://www.patentstorm.us/patents/8459278/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8459278</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A dishwashing machine is provided. The dishwashing machine includes a washing container, at least one device for washing crockery using a washing solution, a heating device, and a sorption drying device communicated with the washing container for the passage of air between the sorption drying device and the washing container. The sorption drying device contains reversibly dehydratable material that operates to withdraw moisture from air during the passage of the air through the sorption ...<br /> 		
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			         <title><![CDATA[Chemical cleaning method and system with steam injection]]></title>
			         <link>http://www.patentstorm.us/patents/8459277/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8459277</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>Disclosed are methods and apparatus for cleaning heat exchangers and similar vessels by introducing chemical cleaning solutions and/or solvents while maintaining a target temperature range by direct steam injection into the cleaning solution. The steam may be injected directly into the heat exchanger or into a temporary side stream loop for recirculating the cleaning solution or admixed with fluids being injected to the heat exchanger. The disclosed methods are suitable for removing ...<br /> 		
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			         <title><![CDATA[Broken wafer recovery system]]></title>
			         <link>http://www.patentstorm.us/patents/8459276/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8459276</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>An apparatus and method for recovery and cleaning of broken substrates, for fabrication systems using silicon wafers. A placing mechanism moves a suction head to a location of the broken substrate and a suction pump coupled to a flexible hose is used to remove the broken pieces. A hood is positioned at the inlet of the suction head, and setback extensions are provided at the bottom of the hood to allow air flow into the inlet and prevent thermal conductance from the tray to the hood. Pins ...<br /> 		
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			         <title><![CDATA[In-situ cleaning system]]></title>
			         <link>http://www.patentstorm.us/patents/8459275/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8459275</li><li><strong>Publication Date:</strong> &nbsp;2013-06-11</li><li><strong>Inventors:</strong> &nbsp;; ; ; </li></ul>
<p>The in situ cleaning system provides an inlet capable of providing feed water to an in situ cleaning component, one or more in situ cleaning components, including water treatment components, an oxidizing agent generating component and/or alkalinity generating component, and an outlet in fluid communication with a washing system, providing a cleaning use solution to the washing ...<br /> 		
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			         <title><![CDATA[Dishwasher]]></title>
			         <link>http://www.patentstorm.us/patents/8454763/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454763</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A dishwasher having a tub defining a wash chamber and at least one dish rack located within the wash chamber. The dishwasher also has at least one spray arm assembly located in the wash chamber, and at least one nozzle located in the wash chamber beneath the dish rack. A diverter valve controls the supply of liquid from a liquid supply to the at least one ...<br /> 		
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			         <title><![CDATA[Dishwasher]]></title>
			         <link>http://www.patentstorm.us/patents/8454762/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454762</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A dishwasher having a tub defining a wash chamber and at least one dish rack located within the wash chamber. The dishwasher also has at least one spray arm located in the wash chamber and at least one nozzle located in the wash chamber and configured to provide a spray of liquid into the dish rack. A diverter valve controls the supply of liquid from a liquid supply to the at least one ...<br /> 		
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			         <title><![CDATA[Apparatus and system for cleaning baseball bases]]></title>
			         <link>http://www.patentstorm.us/patents/8454761/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454761</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>An apparatus for cleaning the surface of a base, comprising: a base; a plurality of apertures flush with the surface of said base, said apertures being connected to a plurality of sub-channels and wherein said apertures are adapted to expel air; at least one air chamber operatively connected with said plurality of sub-channels; a main channel connected with said at least one air chamber; wherein said main channel is supplied from an air compressor; and a main valve located between said at ...<br /> 		
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			         <title><![CDATA[Wafer cleaning with immersed stream or spray nozzle]]></title>
			         <link>http://www.patentstorm.us/patents/8454760/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454760</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Several methods of removing contaminant particles from a surface of a substrate are disclosed herein. In one embodiment, the method includes directing an incompressible fluid spray onto a surface of a substrate to remove contaminant particles from the surface. In an embodiment, the surface of the substrate and the nozzle are both immersed in an incompressible fluid. The fluid can flow across the surface of the substrate to remove the contaminant particles from the area. The fluid spray can ...<br /> 		
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			         <title><![CDATA[Screen wash machine]]></title>
			         <link>http://www.patentstorm.us/patents/8454759/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454759</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Washing machine for screen that includes a closed washing chamber having internal nozzles for cleaning the screen. The nozzles are provided on a flushing frame enclosing the screen, and the flushing frame may be moved upwards and downwards within the chamber whereby the screen is flushed and cleaned. A method for cleaning the screen in the washing machine is also ...<br /> 		
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			         <title><![CDATA[Electrostatic chuck cleaning method]]></title>
			         <link>http://www.patentstorm.us/patents/8454758/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454758</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>An electrostatic chuck cleaning process that cleans an electrostatic chuck, equipped in a chamber, for chucking and holding a substrate. This method has a plasma etching process that performs plasma etching on the electrostatic chuck, a substrate mounting process that mounts a substrate on the electrostatic chuck that was subjected to plasma etching in the plasma etching process, and a substrate removal process that removes the substrate that was mounted on the electrostatic chuck in the ...<br /> 		
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			         <title><![CDATA[Phosphate and phosphonate-free automatic gel dishwashing detergent providing improved spotting and filming performance]]></title>
			         <link>http://www.patentstorm.us/patents/8454757/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454757</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A phosphate and phosphonate-free gel automatic dishwashing detergent provides improved spotting and filming performance by including a spot reduction system that contains a combination of a polyacrylate and a carboxymethyl inulin. The gel detergent may also be free of a bleach ingredient (i.e., it does not contain either chlorine bleach or an oxygen ...<br /> 		
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			         <title><![CDATA[Methods for extending the lifetime of pressure gauges coupled to substrate process chambers]]></title>
			         <link>http://www.patentstorm.us/patents/8454756/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454756</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Methods of extending the lifetime of pressure gauges coupled to process chambers are disclosed herein. In some embodiments, the methods may include isolating the pressure gauge from a processing volume of the process chamber, increasing a moisture content of the processing volume to above a desired moisture level while the pressure gauge is isolated from the processing volume of the process chamber, reducing a moisture content of the processing volume to a desired moisture level, wherein ...<br /> 		
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			         <title><![CDATA[Methods for evacuating particles from a hard drive component]]></title>
			         <link>http://www.patentstorm.us/patents/8454755/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454755</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>An assembly tool is provided. The assembly tool comprises a body, a first vacuum channel defined within the body, and a first locating pin attached to the body. The first locating pin has a shaft portion arranged within a surrounding portion of the body. The first locating pin is configured to engage a first alignment feature of a hard drive component at a first contact area to align the hard drive component with the assembly tool. The body is configured to couple the first vacuum channel ...<br /> 		
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			         <title><![CDATA[Cleaning method and method for manufacturing electronic device]]></title>
			         <link>http://www.patentstorm.us/patents/8454754/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454754</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>A cleaning method includes: producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning a workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece. A method for manufacturing an electronic device includes: producing a workpiece; producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning the workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the ...<br /> 		
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			         <title><![CDATA[Cleaning bullet and method of operating the same]]></title>
			         <link>http://www.patentstorm.us/patents/8454753/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454753</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A cleaning bullet for use in a track can include a compressible body to clean the track, and a motorized device to propel the body through the track. In some embodiments, the motorized device includes wheels rotatably coupled to the device, a motor to drive the wheels, and a power source to supply power to the motor. Also, in some embodiments, one or more wheels engage an inner or outer surface of the track to move the motorized device along the ...<br /> 		
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			         <title><![CDATA[Foreign substance removing apparatus, foreign substance removing method, and storage medium]]></title>
			         <link>http://www.patentstorm.us/patents/8454752/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454752</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of ...<br /> 		
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			         <title><![CDATA[Apparatus, systems and methods for removing debris from a surface]]></title>
			         <link>http://www.patentstorm.us/patents/8454751/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8454751</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Exemplary surface debris removal systems and methods are operable to remove debris from a signal transmitting/receiving surface. An embodiment provides power to, and then removes power from, a conductive memory wire that is secured to a moveable portion of a two-position snap spring. In response to providing the power to the conductive memory wire, a length of the conductive memory wire decreases so that the moveable portion of the two-position snap spring is pulled from an extended ...<br /> 		
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			         <title><![CDATA[Pressure progressing spray fitting apparatus]]></title>
			         <link>http://www.patentstorm.us/patents/8453658/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8453658</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A readily expandable self-cleaning progressive spray system is provided. The system includes a fluid inlet and a series of spray fittings each having a self-sweeping spray nozzle, a timing mechanism, and a pass-through valve. The series of spray fittings are connected in fluid communication to the water inlet such that the fluid passes into and through the spray nozzle of each spray fitting until its timing mechanism expires which subsequently activates its pass-through valve which directs ...<br /> 		
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			         <title><![CDATA[Method and apparatus for assisting the driver of a vehicle to center the vehicle in a wash bay]]></title>
			         <link>http://www.patentstorm.us/patents/8453657/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8453657</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A vehicle washing system associated with a bay in which a vehicle is parked during the washing operation is equipped with a centering target which can be selectively deployed upon entry of a vehicle to assist the driver in placing the vehicle on the longitudinal centerline of the effective washing area in the bay. The target may be provided by a vertically-depending spray arm having internal LEDs which are illuminated in a flashing effect during vehicle entry and in constant colors during ...<br /> 		
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			         <title><![CDATA[Integrated processing and critical point drying systems for semiconductor and MEMS devices]]></title>
			         <link>http://www.patentstorm.us/patents/8453656/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8453656</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Processing and drying of a sample, such as a semiconductor or MEMS device, is achieved using a single pressure chamber. The pressure chamber holds the sample in a sealed interior volume throughout various process steps, such as, but not limited to, photoresist removal, sacrificial layer etching, flushing or rinsing, dehydration, and critical point drying. The pressure chamber is constructed of a chemically-resistant and pressure-resistant material to withstand the various chemicals and ...<br /> 		
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			         <title><![CDATA[Surface treatment apparatus]]></title>
			         <link>http://www.patentstorm.us/patents/8453655/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8453655</li><li><strong>Publication Date:</strong> &nbsp;2013-06-04</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>Inside a single apparatus main body (<b>100</b>), a surface treatment apparatus includes: a treatment cell (<b>11</b>); a vertical rotation shaft (<b>12</b>); an attachment/detachment device; a receiving tank (<b>15</b>); a cover body (<b>16</b>); a plurality of tanks (<b>21</b>); a plurality of surface treatment liquid supply devices (<b>22</b>); a cleaning water supply device; a drain device (<b>3</b>); and a first cleaning device. Upon operation of the surface treatment liquid supply ...<br /> 		
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			         <title><![CDATA[Paint roller cleaning and drying apparatus]]></title>
			         <link>http://www.patentstorm.us/patents/8449693/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449693</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A paint roller cleaning and drying assembly having a hollow cylindrical body having open top and bottom ends and a hingedly attached cover selectively movable between be closed and open position. A nozzle plenum disposed on an inside body surface substantially parallel to the major axis thereof carries a row of spray nozzles. The nozzle plenum may optionally have an interior cross sectional area that varies along its length to equalize fluid pressure delivered to nozzles disposed along the ...<br /> 		
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			         <title><![CDATA[Heliostat field cleaning system]]></title>
			         <link>http://www.patentstorm.us/patents/8449692/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449692</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; ; ; ; ; ; </li></ul>
<p>Systems and methods of heliostat reflector cleaning via a vehicle in a heliostat ...<br /> 		
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			         <title><![CDATA[Liquid solvent abutment unit]]></title>
			         <link>http://www.patentstorm.us/patents/8449691/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449691</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>In order to provide a liquid solvent abutment unit for accelerating the reaction of a liquid solvent against an adhesive member existing between a perforated support plate and a wafer, a liquid solvent abutment unit includes a supply part for supplying a support plate surface with a liquid solvent, a retention part for retaining the supplied liquid solvent in the hole-formed region on the support plate surface; a recovery part for recovering the liquid solvent retained in the hole-formed ...<br /> 		
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			         <title><![CDATA[Sump of dish washer]]></title>
			         <link>http://www.patentstorm.us/patents/8449690/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449690</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>There is provided a sump assembly of a dishwasher. The sump assembly includes a sump case having coupling bosses protruded upward, a sump cover seating on an upper portion of the sump case, the sump cover having a coupling boss and a coupling hole, a self-cleaning filter assembly mounted on a top surface of the sump cover, the self-cleaning assembly having a coupling hole, a fluid passage guide mounted on a bottom of the sump cover, pump lower having a first coupling boss formed on a frame ...<br /> 		
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			         <title><![CDATA[Instrument for cleaning an aluminum workpiece]]></title>
			         <link>http://www.patentstorm.us/patents/8449689/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449689</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A method of conditioning the surface of a work piece, in particular of a litho-strip or litho-sheet, consisting of an aluminum alloy enables an increase in manufacturing speed in surface roughening while maintaining a high quality of the electro-chemical grained surface of the work piece with relative low effort related to facility equipment. The method of conditioning comprises at least the step of degreasing the surface of the work piece with a degreasing medium, wherein the degreasing ...<br /> 		
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			         <title><![CDATA[High-pressure liquid atomisation nozzle for a machine for cleaning optical lenses or other substrates]]></title>
			         <link>http://www.patentstorm.us/patents/8449688/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449688</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>High-pressure washing liquid spray intended for use in a washing machine for ophthalmic glass or other substrates, consisting of an entry opening (<b>11</b>) for washing liquid and an exit opening (<b>12</b>) for liquid in a jet, connected by a channel. The channel (<b>1</b>) has a rectangular channel in cross section which introduces a constriction, in particular in the center, giving that channel an X shape, so as to form, on one hand, downstream of the above-mentioned constriction, an ...<br /> 		
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			         <title><![CDATA[Wash ring assembly and method of use]]></title>
			         <link>http://www.patentstorm.us/patents/8449687/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449687</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; ; </li></ul>
<p>Devices, including a wash ring assembly, and methods are provided for the removal of excess fluid or solids from the exterior or interior of a probe used to transfer fluids, for instance, in an automated assay device. Typically, a probe is used to aspirate and dispense a sample fluid material such as whole blood or a reagent. The devices and methods provided herein are useful for removing excess fluid from the exterior or interior of the probe so as to prevent dripping and ...<br /> 		
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			         <title><![CDATA[Methods for cleaning a drain line of a dialysis machine]]></title>
			         <link>http://www.patentstorm.us/patents/8449686/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449686</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A method for cleaning a drain line of a dialysis machine downstream of a filtration unit. The method includes closing inlet and outlet valves of the filtration unit, and closing a bypass valve along a bypass line that connects a source line to a drain line. The method also includes configuring the balancing chamber such that flow is permitted only via the drain line, flowing an amount of a cleaning agent into the drain line through a cleaning agent valve, and rinsing the cleaning agent from ...<br /> 		
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			         <title><![CDATA[Automatic sanitation system]]></title>
			         <link>http://www.patentstorm.us/patents/8449685/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449685</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>A cover for a pedicure spa containing an automatic sanitation apparatus is disclosed. When activated, the cover automatically sprays disinfectant in a circular motion from a nozzle on the bottom of the cover. The interior surfaces of the pedicure basin are treated with the disinfectant solution. The pedicure basin is thereby efficiently and thoroughly ...<br /> 		
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			         <title><![CDATA[Substrate cleaning method, substrate cleaning system and program storage medium]]></title>
			         <link>http://www.patentstorm.us/patents/8449684/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449684</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank <b>12</b>. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank <b>12</b>, so that the substrate W is subjected to an ultrasonic ...<br /> 		
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			         <title><![CDATA[Apparatus and method for picking up stickers in grassy and other areas]]></title>
			         <link>http://www.patentstorm.us/patents/8449683/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449683</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventor:</strong> &nbsp;</li></ul>
<p>An apparatus and method for picking up stickers in grassy or other ground areas. A roller is rotatably mounted on a frame and a stretchable fabric is removably mounted and stretched on an outer surface of the roller. The fabric is of a construction and thickness to pick up stickers as the roller is moved by the frame and rotated in engagement with a grassy or other ground surface. When the fabric is full of stickers, it is removed from the roller and replaced with a new unused stretchable ...<br /> 		
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			         <title><![CDATA[Swivel broom]]></title>
			         <link>http://www.patentstorm.us/patents/8449682/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449682</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A broom comprises a head supporting bristles. A handle is connected to the head at a swivel joint where the swivel joint allows the handle to feely rotate relative to the head. A lock is movable to a locked position to fix the position of the handle relative to the head when the head is in a first position relative to the handle and an unlocked position where the head is free to rotate relative to the handle. A method of operating a broom comprises providing a head supporting bristles ...<br /> 		
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			         <title><![CDATA[Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate]]></title>
			         <link>http://www.patentstorm.us/patents/8449681/description.html</link>
			         <description><![CDATA[<ul><li><strong>Patent Number:</strong> &nbsp;8449681</li><li><strong>Publication Date:</strong> &nbsp;2013-05-28</li><li><strong>Inventors:</strong> &nbsp;; </li></ul>
<p>A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having a flash point above 80 degrees Celsius and being capable of dissolving acrylic polymer and phenolic polymer. The composition may further comprise Tetramethylammonium Hydroxide (TMAH) mixed with the nontoxic ...<br /> 		
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